Li Tong, Ichimura Masaya
Department of Electrical and Mechanical Engineering, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, Japan.
Materials (Basel). 2021 Feb 4;14(4):724. doi: 10.3390/ma14040724.
Magnesium hydroxide (Mg(OH)) thin films were deposited by the drop-dry deposition (DDD) method using an aqueous solution containing Mg(NO) and NaOH. DDD was performed by dropping the solution on a substrate, heating-drying, and rinsing in water. Effects of different deposition conditions on the surface morphology and optical properties of Mg(OH) thin films were researched. Films with a thickness of 1-2 μm were successfully deposited, and the Raman peaks of Mg(OH) were observed for them. Their transmittance in the visible range was 95% or more, and the bandgap was about 5.8 eV. It was found that the thin films have resistivity of the order of 10 Ωcm. Thus, the transparent and semiconducting Mg(OH) thin films were successfully prepared by DDD.
采用含有硝酸镁（Mg(NO₃)₂）和氢氧化钠（NaOH）的水溶液，通过滴干法（DDD）制备了氢氧化镁（Mg(OH)₂）薄膜。滴干法是将溶液滴在基底上，进行加热干燥，然后在水中冲洗。研究了不同沉积条件对氢氧化镁薄膜表面形貌和光学性能的影响。成功沉积了厚度为1 - 2μm的薄膜，并观察到了它们的氢氧化镁拉曼峰。它们在可见光范围内的透过率为95%或更高，带隙约为5.8eV。发现这些薄膜的电阻率约为10⁶Ω·cm。因此，通过滴干法成功制备了透明且具有半导体性质的氢氧化镁薄膜。
