Li Tong, Ichimura Masaya
Department of Electrical and Mechanical Engineering, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, Japan.
Materials (Basel). 2023 Jul 27;16(15):5273. doi: 10.3390/ma16155273.
The drop-dry deposition (DDD) is a simple chemical technique of thin film deposition, which can be applied to metal oxides. The deposition solution is an aqueous solution including a metal salt and an alkali. However, some metal ions react spontaneously with water and precipitate. This work is the first attempt to use complexing agents in DDD to suppress the precipitation. SnO thin films are fabricated using DDD with NaSO as a complexing agent and via annealing in air. The results of the Auger electron spectroscopy measurement show that the O/Sn composition ratio of the annealed films approached two, indicating that the annealed films are SnO. The photoelectrochemical measurement results show that the annealed films are n-type. CoO/SnO heterojunction is fabricated using p-type CoO films which are also deposited via DDD. The heterojunction has rectification and photovoltaic properties. Thus, for the first time, a metal oxide thin film was successfully prepared via DDD using a complexing agent, and oxide thin film solar cells are successfully prepared using only DDD.
滴干沉积（DDD）是一种简单的薄膜沉积化学技术，可应用于金属氧化物。沉积溶液是一种包含金属盐和碱的水溶液。然而，一些金属离子会与水自发反应并沉淀。这项工作是首次尝试在DDD中使用络合剂来抑制沉淀。以NaSO作为络合剂，通过DDD并在空气中退火制备了SnO薄膜。俄歇电子能谱测量结果表明，退火后薄膜的O/Sn组成比接近2，表明退火后的薄膜是SnO。光电化学测量结果表明，退火后的薄膜是n型的。p型CoO薄膜也通过DDD沉积，制备了CoO/SnO异质结。该异质结具有整流和光伏特性。因此，首次通过使用络合剂的DDD成功制备了金属氧化物薄膜，并且仅使用DDD成功制备了氧化物薄膜太阳能电池。
