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用于高性能薄膜晶体管的导电聚合物辅助金属氧化物混合半导体

Conductive Polymer-Assisted Metal Oxide Hybrid Semiconductors for High-Performance Thin-Film Transistors.

作者信息

Lee Eun Goo, Gong Yong Jun, Lee Sung-Eun, Na Hyun-Jae, Im Changik, Kim Heebae, Kim Youn Sang

机构信息

Program in Nano Science and Technology, Graduate School of Convergence Science and Technology, Seoul National University, 1 Gwanak-ro, Gwanak-gu, Seoul 08826, Republic of Korea.

Samsung Display Company, Ltd, 1 Samsung-ro, Giheung-gu, Yongin-si, Gyeonggi-Do 17113, Republic of Korea.

出版信息

ACS Appl Mater Interfaces. 2021 Feb 24;13(7):8552-8562. doi: 10.1021/acsami.0c21134. Epub 2021 Feb 10.

Abstract

Metal oxide semiconductors doped with additional inorganic cations have insufficient electron mobility for next-generation electronic devices so strategies to realize the semiconductors exhibiting stability and high performance are required. To overcome the limitations of conventional inorganic cation doping to improve the electrical characteristics and stability of metal oxide semiconductors, we propose solution-processed high-performance metal oxide thin-film transistors (TFTs) by incorporating polyaniline (PANI), a conductive polymer, in a metal oxide matrix. The chemical interaction between the metal oxide and PANI demonstrated that the defect sites and crystallinity of the semiconductor layer are controllable. In addition, the change in oxygen-related chemical bonding of PANI-doped indium oxide (InO) TFTs induces superior electrical characteristics compared to pristine InO TFTs, even though trace amounts of PANI are doped in the semiconductor. In particular, the average field-effect mobility remarkably enhanced from 15.02 to 26.58 cm V s, the on/off current ratio improved from 10 to 10, and the threshold voltage became close to 0 V actually from -7.9 to -1.4 V.

摘要

掺杂额外无机阳离子的金属氧化物半导体对于下一代电子器件而言电子迁移率不足,因此需要实现具有稳定性和高性能的半导体的策略。为了克服传统无机阳离子掺杂在改善金属氧化物半导体电学特性和稳定性方面的局限性,我们提出通过将导电聚合物聚苯胺(PANI)掺入金属氧化物基质中来制备溶液处理的高性能金属氧化物薄膜晶体管(TFT)。金属氧化物与聚苯胺之间的化学相互作用表明,半导体层的缺陷位点和结晶度是可控的。此外,与原始氧化铟(InO)TFT相比,聚苯胺掺杂氧化铟(InO)TFT中与氧相关的化学键的变化诱导了优异的电学特性,尽管在半导体中掺杂了痕量的聚苯胺。特别是,平均场效应迁移率从15.02显著提高到26.58 cm² V⁻¹ s⁻¹,开/关电流比从10⁴提高到10⁵,阈值电压实际上从-7.9 V接近到-1.4 V变为接近0 V。

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