Atthi Nithi, Dielen Marc, Sripumkhai Witsaroot, Pattamang Pattaraluck, Meananeatra Rattanawan, Saengdee Pawasuth, Thongsook Oraphan, Ranron Norabadee, Pankong Krynnaras, Uahchinkul Warinrampai, Supadech Jakrapong, Klunngien Nipapan, Jeamsaksiri Wutthinan, Veldhuizen Pim, Ter Meulen Jan Matthijs
Thai Microelectronics Center (TMEC), National Electronics and Computer Technology Center (NECTEC), Chachoengsao 24000, Thailand.
Morphotonics B.V., De Run 4281, 5503 LM Veldhoven, The Netherlands.
Nanomaterials (Basel). 2021 Jan 29;11(2):339. doi: 10.3390/nano11020339.
Bio-inspired surfaces with superamphiphobic properties are well known as effective candidates for antifouling technology. However, the limitation of large-area mastering, patterning and pattern collapsing upon physical contact are the bottleneck for practical utilization in marine and medical applications. In this study, a roll-to-plate nanoimprint lithography (R2P NIL) process using Morphotonics' automated Portis NIL600 tool was used to replicate high aspect ratio (5.0) micro-structures via reusable intermediate flexible stamps that were fabricated from silicon master molds. Two types of Morphotonics' in-house UV-curable resins were used to replicate a micro-pillar (PIL) and circular rings with eight stripe supporters (C-RESS) micro-structure onto polycarbonate (PC) and polyethylene terephthalate (PET) foil substrates. The pattern quality and surface wettability was compared to a conventional polydimethylsiloxane (PDMS) soft lithography process. It was found that the heights of the R2P NIL replicated PIL and C-RESS patterns deviated less than 6% and 5% from the pattern design, respectively. Moreover, the surface wettability of the imprinted PIL and C-RESS patterns was found to be superhydro- and oleophobic and hydro- and oleophobic, respectively, with good robustness for the C-RESS micro-structure. Therefore, the R2P NIL process is expected to be a promising method to fabricate robust C-RESS micro-structures for large-scale anti-biofouling application.
具有超双疏特性的仿生表面作为防污技术的有效候选材料而广为人知。然而,大面积制作、图案化以及物理接触时图案塌陷的局限性是其在海洋和医疗应用中实际应用的瓶颈。在本研究中,使用Morphotonics公司的自动化Portis NIL600工具进行的卷对板纳米压印光刻(R2P NIL)工艺,通过由硅母模制造的可重复使用的中间柔性印章,复制了高纵横比(5.0)的微结构。使用两种Morphotonics公司内部的紫外光固化树脂,将微柱(PIL)和带有八条条纹支撑的圆环(C-RESS)微结构复制到聚碳酸酯(PC)和聚对苯二甲酸乙二酯(PET)箔基材上。将图案质量和表面润湿性与传统的聚二甲基硅氧烷(PDMS)软光刻工艺进行了比较。结果发现,R2P NIL复制的PIL和C-RESS图案的高度与图案设计的偏差分别小于6%和5%。此外,发现压印的PIL和C-RESS图案的表面润湿性分别为超疏水和疏油以及疏水和疏油,且C-RESS微结构具有良好的稳健性。因此,R2P NIL工艺有望成为一种用于制造用于大规模抗生物污损应用的稳健C-RESS微结构的有前途的方法。