特刊社论：纳米压印光刻技术与应用
Editorial for Special Issue: Nanoimprint Lithography Technology and Applications.
作者信息
Muehlberger Michael
机构信息
Profactor GmbH, 4407 Steyr-Gleink, Austria.
出版信息
Nanomaterials (Basel). 2021 Sep 16;11(9):2413. doi: 10.3390/nano11092413.
Abstract
Nanoimprint Lithography (NIL) has been an interesting and growing field over the last years since its beginnings in the mid 1990ies [...].
摘要
自20世纪90年代中期诞生以来，纳米压印光刻技术（NIL）在过去几年里一直是一个备受关注且不断发展的领域。
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