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模拟带张紧幅材的卷对板纳米压印中的残余层厚度

Simulating the Residual Layer Thickness in Roll-to-Plate Nanoimprinting with Tensioned Webs.

作者信息

Snieder Jelle, Dielen Marc, van Ostayen Ron A J

机构信息

Department of Precision and Microsystems Engineering, Delft University of Technology, Mekelweg 2, 2628 CD Delft, The Netherlands.

Morphotonics B.V., De Run 4281, 5503 LM Veldhoven, The Netherlands.

出版信息

Micromachines (Basel). 2022 Mar 18;13(3):461. doi: 10.3390/mi13030461.

DOI:10.3390/mi13030461
PMID:35334753
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8955766/
Abstract

Roll-to-plate nanoimprinting with flexible stamps is a fabrication method to pattern large-area substrates with micro- and nanotextures. The imprint consists of the preferred texture on top of a residual layer, of which the thickness and uniformity is critical for many applications. In this work, a numerical model is developed to predict the residual layer thickness (RLT) as a function of the imprint parameters. The model is based on elastohydrodynamic lubrication (EHL) theory, which combines lubrication theory for the pressure build-up in the resin film, with linear elasticity theory for the elastic deformation of the roller material. The model is extended with inextensible cylindrical shell theory to capture the effect of the flexible stamp, which is treated as a tensioned web. The results show that an increase in the tension of the web increases the effective stiffness of the roller, resulting in a reduction in the RLT. The numerical results are validated with layer height measurements from flat layer imprints. It is shown that the simulated minimum layer height corresponds very well with the experimental results for a wide range of resin viscosities, imprint velocities, and imprint loads.

摘要

使用柔性印模的滚压到平板纳米压印是一种在大面积基板上形成微纳纹理图案的制造方法。印记由残余层顶部的优选纹理组成,残余层的厚度和均匀性对许多应用至关重要。在这项工作中,开发了一个数值模型来预测残余层厚度(RLT)作为压印参数的函数。该模型基于弹流润滑(EHL)理论,该理论将树脂膜中压力建立的润滑理论与辊材料弹性变形的线性弹性理论相结合。该模型用不可伸长圆柱壳理论进行扩展,以捕捉柔性印模的影响,柔性印模被视为张紧的腹板。结果表明,腹板张力的增加会增加辊的有效刚度,从而导致RLT减小。数值结果通过平层印记的层高度测量进行验证。结果表明,对于广泛的树脂粘度、压印速度和压印载荷,模拟的最小层高度与实验结果非常吻合。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/eeb5ffa89d30/micromachines-13-00461-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/af7d0e67320d/micromachines-13-00461-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/e0dbd36a5fbf/micromachines-13-00461-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/c9144514031e/micromachines-13-00461-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/640096bc855e/micromachines-13-00461-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/d6ddbbd80f37/micromachines-13-00461-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/6f8951e77dc6/micromachines-13-00461-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/4e7a67a840da/micromachines-13-00461-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/eeb5ffa89d30/micromachines-13-00461-g008.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/af7d0e67320d/micromachines-13-00461-g001.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/e0dbd36a5fbf/micromachines-13-00461-g002.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/c9144514031e/micromachines-13-00461-g003.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/640096bc855e/micromachines-13-00461-g004.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/d6ddbbd80f37/micromachines-13-00461-g005.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/6f8951e77dc6/micromachines-13-00461-g006.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/4e7a67a840da/micromachines-13-00461-g007.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/b47c/8955766/eeb5ffa89d30/micromachines-13-00461-g008.jpg

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本文引用的文献

1
Process Optimization for Manufacturing Functional Nanosurfaces by Roll-to-Roll Nanoimprint Lithography.用于通过卷对卷纳米压印光刻制造功能性纳米表面的工艺优化
Nanomaterials (Basel). 2022 Jan 29;12(3):480. doi: 10.3390/nano12030480.
2
Fabrication of High Aspect Ratio Micro-Structures with Superhydrophobic and Oleophobic Properties by Using Large-Area Roll-to-Plate Nanoimprint Lithography.利用大面积卷对板纳米压印光刻技术制备具有超疏水和超疏油性能的高深宽比微结构
Nanomaterials (Basel). 2021 Jan 29;11(2):339. doi: 10.3390/nano11020339.
3
A review of roll-to-roll nanoimprint lithography.
卷对卷纳米压印光刻综述。
Nanoscale Res Lett. 2014 Jun 25;9(1):320. doi: 10.1186/1556-276X-9-320. eCollection 2014.
4
Large-area roll-to-roll and roll-to-plate nanoimprint lithography: a step toward high-throughput application of continuous nanoimprinting.大面积卷对卷和卷对板纳米压印光刻技术:迈向连续纳米压印高通量应用的一步。
ACS Nano. 2009 Aug 25;3(8):2304-10. doi: 10.1021/nn9003633.