Haslinger Michael J, Maier Oliver S, Pribyl Markus, Taus Philipp, Kopp Sonja, Wanzenboeck Heinz D, Hingerl Kurt, Muehlberger Michael M, Guillén Elena
PROFACTOR GmbH, 4407 Steyr-Gleink, Austria.
Center for Surface and Nanoanalytics, Johannes Kepler University Linz, 4040 Linz, Austria.
Nanomaterials (Basel). 2023 May 5;13(9):1556. doi: 10.3390/nano13091556.
Structural anti-reflective coating and bactericidal surfaces, as well as many other effects, rely on high-aspect-ratio (HAR) micro- and nanostructures, and thus, are of great interest for a wide range of applications. To date, there is no widespread fabrication of dense or isolated HAR nanopillars based on UV nanoimprint lithography (UV-NIL). In addition, little research on fabricating isolated HAR nanopillars via UV-NIL exists. In this work, we investigated the mastering and replication of HAR nanopillars with the smallest possible diameters for dense and isolated arrangements. For this purpose, a UV-based nanoimprint lithography process was developed. Stability investigations with capillary forces were performed and compared with simulations. Finally, strategies were developed in order to increase the stability of imprinted nanopillars or to convert them into nanoelectrodes. We present UV-NIL replication of pillars with aspect ratios reaching up to 15 with tip diameters down to 35 nm for the first time. We show that the stability could be increased by a factor of 58 when coating them with a 20 nm gold layer and by a factor of 164 when adding an additional 20 nm thick layer of SiN. The coating of the imprints significantly improved the stability of the nanopillars, thus making them interesting for a wide range of applications.
结构抗反射涂层和杀菌表面以及许多其他效应都依赖于高纵横比（HAR）的微米和纳米结构，因此在广泛的应用中具有重要意义。迄今为止，基于紫外纳米压印光刻（UV-NIL）技术，尚未广泛制造出密集或孤立的HAR纳米柱。此外，关于通过UV-NIL制造孤立的HAR纳米柱的研究也很少。在这项工作中，我们研究了用于密集和孤立排列的尽可能小直径的HAR纳米柱的母版制作和复制。为此，开发了一种基于紫外的纳米压印光刻工艺。进行了毛细力稳定性研究并与模拟结果进行了比较。最后，制定了提高压印纳米柱稳定性或将其转化为纳米电极的策略。我们首次展示了纵横比高达15且尖端直径低至35 nm的柱体的UV-NIL复制。我们表明，当用20 nm厚的金层涂覆时，稳定性可提高58倍，当添加额外的20 nm厚的SiN层时，稳定性可提高164倍。印记的涂层显著提高了纳米柱的稳定性，因此使其在广泛的应用中具有吸引力。
