一种用于同时测量层折射率和厚度的集成倏逝场传感器。

An Integrated Evanescent Field Sensor for the Simultaneous Measurement of Layer Refractive Index and Thickness.

作者信息

Jäger Matthias, Bruns Jürgen, Schneidewind Jessica, Pinnow Cay, Gargouri Hassan, Petermann Klaus

机构信息

Fachgebiet Hochfrequenztechnik/Photonik, HFT4, Technische Universität Berlin, 10587 Berlin, Germany.

Plasma Process Technology group, SENTECH Instruments GmbH, 12489 Berlin, Germany.

出版信息

Sensors (Basel). 2021 Feb 26;21(5):1628. doi: 10.3390/s21051628.

DOI:10.3390/s21051628

PMID:33652576

原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC7956392/

Abstract

A novel integrated sensor for the simultaneous measurement of layer refractive index and thickness based on evanescent fields is proposed. The theoretical limits for the accuracy of the sensor were examined for the example of a TiO2 layer. The influence of production tolerance on the accuracy was evaluated. In the experimental part of this work, a sensor chip containing nanowire and nanorib waveguides realized in silicon on insulator technology was used to demonstrate the detection of refractive index and thickness of a TiO2 atomic layer deposition (ALD) layer.

摘要

提出了一种基于倏逝场同时测量层折射率和厚度的新型集成传感器。以TiO2层为例，研究了该传感器精度的理论极限。评估了生产公差对精度的影响。在这项工作的实验部分，使用了一个包含在绝缘体上硅技术中实现的纳米线和纳米肋波导的传感器芯片，来演示对TiO2原子层沉积（ALD）层的折射率和厚度的检测。