Cheng E, Tang Suzhou, Zou Helin, Qiao Guochao, Zhang Zhengyan
School of Mechanical Engineering, Hebei University ofTechnology, Tianjin, 300401, China.
School of Economics and Management, Tianjin University of Science and Technology, Tianjin, 300457, China.
J Nanosci Nanotechnol. 2021 Sep 1;21(9):4852-4856. doi: 10.1166/jnn.2021.19349.
The fabrication of inexpensive nano-gaps is vitally important for the research and application of nanochannel-based devices. This study presents a low-cost and simple method for the fabrication of nano-gaps using thermal evaporation and stripping techniques. The structural morphology of metal films deposited on the convex structures of photoresist by sputtering and thermal evaporation was studied. The effect of angles of thermal evaporation on the width of nano-gaps was investigated. The characteristics of metal film deposited on the convex structures of photoresist and spaces between these convex structures after stripping were investigated, and the adhesive force between the metal film and silicon substrate was also analyzed. Finally, a metal film of Cu was deposited on the convex structures of photoresist by thermal evaporation. After stripping, nano-gaps with a width of 187 nm were fabricated. The method proposed in this paper can be employed to mass-produce two-dimensional nanochannels based devices at low cost.
制造廉价的纳米间隙对于基于纳米通道的器件的研究和应用至关重要。本研究提出了一种使用热蒸发和剥离技术制造纳米间隙的低成本且简单的方法。研究了通过溅射和热蒸发沉积在光刻胶凸结构上的金属膜的结构形态。研究了热蒸发角度对纳米间隙宽度的影响。研究了光刻胶凸结构上沉积的金属膜的特性以及剥离后这些凸结构之间的间距，同时还分析了金属膜与硅衬底之间的附着力。最后，通过热蒸发在光刻胶的凸结构上沉积了一层铜金属膜。剥离后，制造出了宽度为187 nm的纳米间隙。本文提出的方法可用于低成本大规模生产基于二维纳米通道的器件。
