CSIR-Central Electrochemical Research Institute (CSIR-CECRI), Karaikudi, 630 006, India; Department of Applied Mechanics, Indian Institute of Technology Madras, Chennai, 600 036, India.
Bioceramics and Coating Division, CSIR-Central Glass & Ceramic Research Institute, Kolkata, 700032, India.
Colloids Surf B Biointerfaces. 2021 Jun;202:111684. doi: 10.1016/j.colsurfb.2021.111684. Epub 2021 Mar 8.
The aim of our study is to investigate the effect of boron with different ratios in Ti-Cu-Pd-Zr metallic glass (MG) matrix (Ti-Cu-Pd-Zr:B) fabricated by Pulsed Laser Deposition (PLD) for biomedical implants. The Ti based Thin Film Metallic Glasses (TFMGs) in combination with boron (in different atomic %) was assessed in attaining the combined properties, like outstanding corrosion resistant properties and good biocompatibility in this work. The disordered structure and amorphous nature of the Ti-Cu-Pd-Zr:B thin films systems were achieved by the PLD process and affirmed by XRD and transmission electron microscopy. The boron incorporation in the TFMG has been elucidated by XPS analysis. The boron containing films displays distribution of boron protuberances interleaved in the amorphous matrix was stated from SEM analysis. It is found that increase in atomic percentage of boron contents in TFMG results in the improvement in glass transition temperatures. The electrochemical parameters suggest better corrosion resistance and capabilities of passivity when boron percentage was increased in the film thereby preventing adverse biological reactions. TFMGs exhibited excellent hemocompatibility by preventing the platelet activation. MTT assay manifests increase in cell concentration with culture period on the TFMGs for the MC3T3-E1 preosteoblasts cells. Cell morphology was also studied which confirmed the viable state of the cells on the TFMG surfaces. The combination of such distinctive properties marks these TFMG systems as prospective aspirants for biomedical implants.
我们的研究目的是研究不同硼比的硼对通过脉冲激光沉积（PLD）制备的用于生物医学植入物的 Ti-Cu-Pd-Zr 金属玻璃（MG）基体（Ti-Cu-Pd-Zr：B）的影响。这项工作评估了 Ti 基薄膜金属玻璃（TFMG）与硼（不同原子百分比）相结合，以获得综合性能，如出色的耐腐蚀性能和良好的生物相容性。通过 PLD 工艺实现了 Ti-Cu-Pd-Zr：B 薄膜系统的无序结构和非晶态性质，并通过 XRD 和透射电子显微镜得到证实。XPS 分析阐明了硼在 TFMG 中的掺入。SEM 分析表明，硼的存在导致了硼凸起在非晶基体中的分布。研究发现，随着 TFMG 中硼含量原子百分比的增加，玻璃化转变温度得到提高。电化学参数表明，当薄膜中的硼含量增加时，耐腐蚀性和钝化能力得到提高，从而防止了不良的生物反应。TFMG 通过防止血小板激活而表现出优异的血液相容性。MTT 分析表明，MC3T3-E1 前成骨细胞在 TFMG 上的培养周期内细胞浓度增加。还研究了细胞形态，证实了细胞在 TFMG 表面的存活状态。这些独特性能的结合使这些 TFMG 系统成为生物医学植入物的有前途的候选者。
