Chakraborty Rajat, Ahmed Shahnewaz, Subrina Samia
Department of Electrical and Electronic Engineering, Bangladesh University of Engineering and Technology, Dhaka, 1205, Bangladesh.
Nanotechnology. 2021 May 3;32(30). doi: 10.1088/1361-6528/abf6ef.
Substitutional doping has traditionally been used to modulate the existing properties of semiconductors and introduce new exciting properties, especially in two-dimensional materials. In this work, we have investigated the impact of substitutional doping (using group III, IV, V, and VI dopants) on the structural, electronic, spin, and optical properties of GeSe monolayer by using first-principles calculations based on density functional theory. Our calculated binding energies, formation energies and phonon dispersion curves of the doped systems support their stability and hence the feasibility of physical realization. Our results further suggest that switching between metallic and semiconducting states of GeSe monolayer can be controlled by dopant atoms with a different number of valence electrons. The band gap of the semiconducting structures can be tuned within a range of 0.2864 eV to 1.17 eV by substituting with different dopants. In addition, most of the doped structures maintain the low effective mass, 0.20m0to 0.59m0for electron and 0.21m0to 0.52m0for hole, which ensures the enhanced transport properties of GeSe based electronic devices. Moreover, when Ge is substituted with group V dopants, a magnetic moment is introduced in an otherwise non-magnetic GeSe monolayer. The optical absorption coefficient of the doped structures can be significantly improved (>2×) in the visible and infrared regions. These intriguing results would encourage the applications of doped GeSe monolayer in next-generation electronic, optoelectronic and spintronic devices.
传统上,替代掺杂被用于调节半导体的现有特性并引入令人兴奋的新特性,尤其是在二维材料中。在这项工作中,我们基于密度泛函理论,通过第一性原理计算研究了替代掺杂(使用III族、IV族、V族和VI族掺杂剂)对GeSe单层的结构、电子、自旋和光学性质的影响。我们计算得到的掺杂体系的结合能、形成能和声子色散曲线支持了它们的稳定性,从而证明了物理实现的可行性。我们的结果进一步表明,GeSe单层的金属态和半导体态之间的转变可以由具有不同价电子数的掺杂原子控制。通过用不同的掺杂剂替代,可以将半导体结构的带隙在0.2864 eV至1.17 eV的范围内进行调节。此外,大多数掺杂结构保持低有效质量,电子的有效质量为0.20m0至0.59m0,空穴的有效质量为0.21m0至0.52m0,这确保了基于GeSe的电子器件的传输性能得到增强。此外,当用V族掺杂剂替代Ge时,在原本非磁性的GeSe单层中引入了磁矩。掺杂结构的光学吸收系数在可见光和红外区域可以显著提高(>2倍)。这些有趣的结果将促进掺杂GeSe单层在下一代电子、光电子和自旋电子器件中的应用。