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纳米制造技术:挑战与未来展望

Nanofabrication Techniques: Challenges and Future Prospects.

作者信息

Tahir Usama, Shim Young Bo, Kamran Muhammad Ahmad, Kim Doo-In, Jeong Myung Yung

机构信息

Department of Cogno-Mechatronics Engineering, Pusan National University, Busan 46241, South Korea.

Department of Opto-Mechatronics Engineering, Pusan National University, Busan 46241, South Korea.

出版信息

J Nanosci Nanotechnol. 2021 Oct 1;21(10):4981-5013. doi: 10.1166/jnn.2021.19327.

Abstract

Nanofabrication of functional micro/nano-features is becoming increasingly relevant in various electronic, photonic, energy, and biological devices globally. The development of these devices with special characteristics originates from the integration of low-cost and high-quality micro/nano-features into 3D-designs. Great progress has been achieved in recent years for the fabrication of micro/nanostructured based devices by using different imprinting techniques. The key problems are designing techniques/approaches with adequate resolution and consistency with specific materials. By considering optical device fabrication on the large-scale as a context, we discussed the considerations involved in product fabrication processes compatibility, the feature's functionality, and capability of bottom-up and top-down processes. This review summarizes the recent developments in these areas with an emphasis on established techniques for the micro/nano-fabrication of 3-dimensional structured devices on large-scale. Moreover, numerous potential applications and innovative products based on the large-scale are also demonstrated. Finally, prospects, challenges, and future directions for device fabrication are addressed precisely.

摘要

在全球范围内,功能性微纳特征的纳米制造在各种电子、光子、能源和生物设备中变得越来越重要。这些具有特殊特性的设备的发展源于将低成本、高质量的微纳特征集成到三维设计中。近年来,通过使用不同的压印技术来制造基于微纳结构的设备已经取得了巨大进展。关键问题在于设计具有足够分辨率且与特定材料相匹配的技术/方法。以大规模光学器件制造为背景,我们讨论了产品制造工艺兼容性、特征功能以及自下而上和自上而下工艺能力等方面的考虑因素。本综述总结了这些领域的最新进展,重点关注大规模三维结构化器件微纳制造的成熟技术。此外,还展示了许多基于大规模的潜在应用和创新产品。最后,精确阐述了器件制造的前景、挑战和未来方向。

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