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碳化硅光电导半导体开关的传导特性对补偿类型和晶格结构的依赖性。

Dependence of conduction characteristics on compensation type and lattice structure of SiC photoconductive semiconductor switches.

作者信息

Feng Zhuoyun, Xiao Longfei, Luan Chongbian, Li Yangfan, Sha Huiru, Li Hongtao, Xu Xiangang

出版信息

Appl Opt. 2021 Apr 10;60(11):3182-3186. doi: 10.1364/AO.420840.

DOI:10.1364/AO.420840
PMID:33983217
Abstract

Semi-insulating (SI) SiC photoconductive semiconductor switches were prepared using two compensation mechanisms: namely vanadium dopants compensation (4H- and 6H-SiC) and deep level defect compensation (4H-SiC). The bias voltage and current of the high-purity (HP) SI 4H-SiC photoconductive semiconductor switch (PCSS) with a channel length of 1 mm reached 24 kV and 364 A, respectively, and the minimum on-state resistance of approximately 1 Ω was triggered by laser illumination at a wavelength of 355 nm. The experimental results show that, in this case, the on-state characteristics of HP 4H-SiC PCSS are superior to those of the vanadium-doped(VD) 4H and 6H-SiC PCSS devices. HP 4H-SiC PCSS shows remarkable waveform consistency. Unlike for VD 4H and 6H-SiC PCSS, the current waveform of HP 4H-SiC PCSS exhibits a tailing phenomenon due to its longer carrier lifetime.

摘要

半绝缘(SI)碳化硅光电导半导体开关是利用两种补偿机制制备的:即钒掺杂补偿(4H-和6H-碳化硅)和深能级缺陷补偿(4H-碳化硅)。沟道长度为1mm的高纯度(HP)SI 4H-碳化硅光电导半导体开关(PCSS)的偏置电压和电流分别达到24kV和364A,并且在波长为355nm的激光照射下触发了约1Ω的最小导通电阻。实验结果表明,在这种情况下,HP 4H-碳化硅PCSS的导通特性优于钒掺杂(VD)4H和6H-碳化硅PCSS器件。HP 4H-碳化硅PCSS显示出显著的波形一致性。与VD 4H和6H-碳化硅PCSS不同,HP 4H-碳化硅PCSS的电流波形由于其较长的载流子寿命而呈现拖尾现象。

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