Zhang Fengyuan, Fan Hua, Han Bing, Zhu Yudong, Deng Xiong, Edwards David, Kumar Amit, Chen Deyang, Gao Xingsen, Fan Zhen, Rodriguez Brian J
School of Physics, University College Dublin, Belfield, Dublin D04 V1W8, Ireland.
Conway Institute of Biomolecular and Biomedical Research, University College Dublin, Belfield, Dublin D04 V1W8, Ireland.
ACS Appl Mater Interfaces. 2021 Jun 9;13(22):26180-26186. doi: 10.1021/acsami.1c04912. Epub 2021 May 26.
When scaling the lateral size of a ferroelectric random access memory (FeRAM) device down to the nanometer range, the polarization switching-induced displacement current becomes small and challenging to detect, which greatly limits the storage density of FeRAM. Here, we report the observation of significantly enhanced injection currents, much larger than typical switching currents, induced by polarization switching in BiFeO thin films via conductive atomic force microscopy. Interestingly, this injected current can be effectively modulated by applying mechanical force. As the loading force increases from ∼50 to ∼750 nN, the magnitude of the injected current increases and the critical voltage to trigger the current injection decreases. Notably, changing the loading force by an order of magnitude increases the peak current by 2-3 orders of magnitude. The mechanically boosted injected current could be useful for the development of high-density FeRAM devices. The mechanical modulation of the injected current may be attributed to the mechanical force-induced changes in the barrier height and interfacial layer width.
当将铁电随机存取存储器(FeRAM)器件的横向尺寸缩小到纳米范围时,极化切换引起的位移电流会变小且难以检测,这极大地限制了FeRAM的存储密度。在此,我们报告通过导电原子力显微镜观察到BiFeO薄膜中极化切换诱导的注入电流显著增强,远大于典型的切换电流。有趣的是,通过施加机械力可以有效调制这种注入电流。随着加载力从约50 nN增加到约750 nN,注入电流的大小增加,触发电流注入的临界电压降低。值得注意的是,将加载力改变一个数量级会使峰值电流增加2 - 3个数量级。机械增强的注入电流可能对高密度FeRAM器件的开发有用。注入电流的机械调制可能归因于机械力引起的势垒高度和界面层宽度的变化。