Roldán Juan B, González-Cordero Gerardo, Picos Rodrigo, Miranda Enrique, Palumbo Félix, Jiménez-Molinos Francisco, Moreno Enrique, Maldonado David, Baldomá Santiago B, Moner Al Chawa Mohamad, de Benito Carol, Stavrinides Stavros G, Suñé Jordi, Chua Leon O
Departamento de Electrónica y Tecnología de Computadores, Facultad de Ciencias, Universidad de Granada, Avd. Fuentenueva s/n, 18071 Granada, Spain.
Industrial Engineering and Construction Department, University of Balearic Islands, 07122 Palma, Spain.
Nanomaterials (Basel). 2021 May 11;11(5):1261. doi: 10.3390/nano11051261.
Resistive Random Access Memories (RRAMs) are based on resistive switching (RS) operation and exhibit a set of technological features that make them ideal candidates for applications related to non-volatile memories, neuromorphic computing and hardware cryptography. For the full industrial development of these devices different simulation tools and compact models are needed in order to allow computer-aided design, both at the device and circuit levels. Most of the different RRAM models presented so far in the literature deal with temperature effects since the physical mechanisms behind RS are thermally activated; therefore, an exhaustive description of these effects is essential. As far as we know, no revision papers on thermal models have been published yet; and that is why we deal with this issue here. Using the heat equation as the starting point, we describe the details of its numerical solution for a conventional RRAM structure and, later on, present models of different complexity to integrate thermal effects in complete compact models that account for the kinetics of the chemical reactions behind resistive switching and the current calculation. In particular, we have accounted for different conductive filament geometries, operation regimes, filament lateral heat losses, the use of several temperatures to characterize each conductive filament, among other issues. A 3D numerical solution of the heat equation within a complete RRAM simulator was also taken into account. A general memristor model is also formulated accounting for temperature as one of the state variables to describe electron device operation. In addition, to widen the view from different perspectives, we deal with a thermal model contextualized within the quantum point contact formalism. In this manner, the temperature can be accounted for the description of quantum effects in the RRAM charge transport mechanisms. Finally, the thermometry of conducting filaments and the corresponding models considering different dielectric materials are tackled in depth.
电阻式随机存取存储器(RRAM)基于电阻开关(RS)操作,并展现出一系列技术特性,使其成为与非易失性存储器、神经形态计算和硬件加密相关应用的理想候选者。为了实现这些器件的全面工业发展,需要不同的仿真工具和紧凑模型,以便在器件和电路层面进行计算机辅助设计。由于电阻开关背后的物理机制是热激活的,因此迄今为止文献中提出的大多数不同RRAM模型都涉及温度效应;所以,对这些效应进行详尽描述至关重要。据我们所知,尚未发表关于热模型的综述论文;这就是我们在此探讨此问题的原因。以热方程为起点,我们描述了传统RRAM结构的数值解细节,随后提出了不同复杂度的模型,以将热效应整合到完整的紧凑模型中,这些模型考虑了电阻开关背后化学反应的动力学以及电流计算。特别是,我们考虑了不同的导电丝几何形状、操作模式、丝的横向热损失、使用多个温度来表征每个导电丝等问题。还考虑了完整RRAM模拟器内热方程的三维数值解。还制定了一个通用的忆阻器模型,将温度作为描述电子器件操作的状态变量之一。此外,为了从不同角度拓宽视野,我们探讨了量子点接触形式体系中的热模型。通过这种方式,可以在RRAM电荷传输机制中考虑温度对量子效应的描述。最后,深入探讨了导电丝的测温以及考虑不同介电材料的相应模型。