Li Fang-Qiang, Zhang Yang, Zhang Sheng-Li
School of Electronic and Information Engineering, Changshu Institute of Technology, Changshu 215500, China.
Ministry of Education Key Laboratory for Nonequilibrium Synthesis and Modulation of Condensed Matter, School of Physics, Xi'an Jiaotong University, Xi'an 710049, China.
Nanomaterials (Basel). 2021 May 25;11(6):1395. doi: 10.3390/nano11061395.
Defects and in-plane strain have significant effects on the electronic properties of two-dimensional nanostructures. However, due to the influence of substrate and environmental conditions, defects and strain are inevitable during the growth or processing. In this study, hybrid density functional theory was employed to systematically investigate the electronic properties of boron-phosphide monolayers tuned by the in-plane biaxial strain and defects. Four types of defects were considered: B-vacancy (B_v), P-vacancy (P_v), double vacancy (D_v), and Stone-Wales (S-W). Charge density difference and Bader charge analysis were performed to characterize the structural properties of defective monolayers. All of these defects could result in the boron-phosphide monolayer being much softer with anisotropic in-plane Young's modulus, which is different from the isotropic modulus of the pure layer. The calculated electronic structures show that the P_v, D_v, and S-W defective monolayers are indirect band gap semiconductors, while the B_v defective system is metallic, which is different from the direct band gap of the pure boron-phosphide monolayer. In addition, the in-plane biaxial strain can monotonically tune the band gap of the boron-phosphide monolayer. The band gap increases with the increasing tension strain, while it decreases as the compression strain increases. Our results suggest that the defects and in-plane strain are effective for tuning the electronic properties of the boron-phosphide monolayer, which could motivate further studies to exploit the promising application in electronics and optoelectronics based on the boron-phosphide monolayer.
缺陷和面内应变对二维纳米结构的电子性质有显著影响。然而,由于衬底和环境条件的影响,在生长或加工过程中缺陷和应变是不可避免的。在本研究中,采用杂化密度泛函理论系统地研究了面内双轴应变和缺陷对磷化硼单层电子性质的影响。考虑了四种类型的缺陷:硼空位(B_v)、磷空位(P_v)、双空位(D_v)和斯通-威尔士(S-W)。进行了电荷密度差和巴德电荷分析以表征有缺陷单层的结构性质。所有这些缺陷都会导致磷化硼单层变得更软,且面内杨氏模量具有各向异性,这与纯层的各向同性模量不同。计算得到的电子结构表明,P_v、D_v和S-W缺陷单层是间接带隙半导体,而B_v缺陷体系是金属性的,这与纯磷化硼单层的直接带隙不同。此外,面内双轴应变可以单调地调节磷化硼单层的带隙。带隙随拉伸应变的增加而增大,而随压缩应变的增加而减小。我们的结果表明,缺陷和面内应变对于调节磷化硼单层的电子性质是有效的,这可能会激发进一步的研究,以开发基于磷化硼单层在电子学和光电子学方面的潜在应用。