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再掺杂WS单层中的杂质诱导发射

Impurity-Induced Emission in Re-Doped WS Monolayers.

作者信息

Loh Leyi, Chen Yifeng, Wang Junyong, Yin Xinmao, Tang Chi Sin, Zhang Qi, Watanabe Kenji, Taniguchi Takashi, Wee Andrew Ts, Bosman Michel, Quek Su Ying, Eda Goki

机构信息

Department of Physics, National University of Singapore, 2 Science Drive 3, 117551 Singapore.

Department of Materials Science and Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore.

出版信息

Nano Lett. 2021 Jun 23;21(12):5293-5300. doi: 10.1021/acs.nanolett.1c01439. Epub 2021 Jun 11.

Abstract

Impurity doping is a viable route toward achieving desired subgap optical response in semiconductors. In strongly excitonic two-dimensional (2D) semiconductors such as transition metal dichalcogenides (TMDs), impurities are expected to result in bound-exciton emission. However, doped TMDs often exhibit a broad Stokes-shifted emission without characteristic features, hampering strategic materials engineering. Here we report observation of a well-defined impurity-induced emission in monolayer WS substitutionally doped with rhenium (Re), which is an electron donor. The emission exhibits characteristics of localized states and dominates the spectrum up to 200 K. Gate dependence reveals that neutral impurity centers are responsible for the observed emission. Using GW-Bethe-Salpeter equation (GW-BSE) calculations, we attribute the emission to transitions between spin-split upper Re band and valence band edge.

摘要

杂质掺杂是在半导体中实现所需亚带隙光学响应的可行途径。在强激子二维(2D)半导体(如过渡金属二硫属化物(TMD))中,杂质预计会导致束缚激子发射。然而,掺杂的TMD通常表现出没有特征的宽斯托克斯位移发射,这阻碍了战略材料工程。在这里,我们报告了在单层WS中观察到明确的杂质诱导发射,该单层WS被铼(Re)替代掺杂,铼是一种电子供体。该发射表现出局域态的特征,并且在高达200 K的温度下主导光谱。栅极依赖性表明中性杂质中心是观察到的发射的原因。使用GW-贝塞耳-萨尔彼得方程(GW-BSE)计算,我们将该发射归因于自旋分裂的上Re带与价带边缘之间的跃迁。

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