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软光刻技术在微纳尺度图案化中的应用。

Soft lithography for micro- and nanoscale patterning.

机构信息

Nano Research Facility and Department of Energy, Environmental, and Chemical Engineering, Washington University, St. Louis, Missouri, USA.

出版信息

Nat Protoc. 2010 Mar;5(3):491-502. doi: 10.1038/nprot.2009.234. Epub 2010 Feb 18.

DOI:10.1038/nprot.2009.234
PMID:20203666
Abstract

This protocol provides an introduction to soft lithography--a collection of techniques based on printing, molding and embossing with an elastomeric stamp. Soft lithography provides access to three-dimensional and curved structures, tolerates a wide variety of materials, generates well-defined and controllable surface chemistries, and is generally compatible with biological applications. It is also low in cost, experimentally convenient and has emerged as a technology useful for a number of applications that include cell biology, microfluidics, lab-on-a-chip, microelectromechanical systems and flexible electronics/photonics. As examples, here we focus on three of the commonly used soft lithographic techniques: (i) microcontact printing of alkanethiols and proteins on gold-coated and glass substrates; (ii) replica molding for fabrication of microfluidic devices in poly(dimethyl siloxane), and of nanostructures in polyurethane or epoxy; and (iii) solvent-assisted micromolding of nanostructures in poly(methyl methacrylate).

摘要

本方案提供了软光刻技术的介绍——一系列基于印刷、模压和压印弹性印章的技术。软光刻技术可用于三维和曲面结构,可兼容多种材料,能够生成明确可控的表面化学物质,并且通常与生物应用兼容。它的成本低,实验方便,已经成为一种适用于许多应用的技术,包括细胞生物学、微流控、芯片实验室、微机电系统和柔性电子学/光子学。作为示例,这里我们重点介绍三种常用的软光刻技术:(i)金涂层和玻璃衬底上的烷硫醇和蛋白质的微接触印刷;(ii)用于在聚二甲基硅氧烷中制造微流控器件以及在聚氨酯或环氧树脂中制造纳米结构的复制模塑;以及(iii)用于在聚甲基丙烯酸甲酯中制造纳米结构的溶剂辅助微成型。

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