Chen Yi-Cheng, Hsiung Yi-Kai, Chang Chih-Yuan, Ou Shih-Fu
Department of Mold and Die Engineering, National Kaohsiung University of Science and Technology, Kaohsiung 807618, Taiwan.
Materials (Basel). 2021 Oct 4;14(19):5808. doi: 10.3390/ma14195808.
Indium tin oxide (ITO) thin films on polycarbonate (PC) substrates were patterned using the laser direct-write (LDW) technique to form an isolation line. The effect of the LDW parameters (power, pulse repetition rate, and defocusing distance) on the isolation line width, depth and roughness of the PC within the line was investigated. Additionally, the Taguchi method of experimental design was applied to determine the optimal parameters of LDW. Results showed that increasing the power led to an increase in the isolation line width and decrease in the surface roughness of the PC within the line. The increase in the pulse repetition rate and defocusing distance caused a decrease in the isolation line width. The optimal parameters were found to be A2B3C3, consisting of power of 5 W, pulse repetition rate of 100 kHz, and defocusing distance of +3 mm. Under these parameters, we obtained an isolation line width of 48.4 μm, and a surface roughness of Ra 38 nm of the PC within the isolation line. We confirmed that the ITO films separated by the isolation lines attained electrical isolation.
采用激光直写(LDW)技术对聚碳酸酯(PC)基板上的氧化铟锡(ITO)薄膜进行图案化处理,以形成隔离线。研究了LDW参数(功率、脉冲重复率和离焦距离)对隔离线宽度、深度以及线内PC粗糙度的影响。此外,应用田口实验设计方法来确定LDW的最佳参数。结果表明,增加功率会导致隔离线宽度增加,且线内PC的表面粗糙度降低。脉冲重复率和离焦距离的增加会导致隔离线宽度减小。发现最佳参数为A2B3C3,即功率为5 W、脉冲重复率为100 kHz、离焦距离为+3 mm。在这些参数下,我们获得了48.4μm的隔离线宽度,以及隔离线内PC的表面粗糙度Ra为38 nm。我们证实,由隔离线分隔的ITO薄膜实现了电隔离。