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用有机溶剂增强聚酰亚胺膜中的重离子径迹蚀刻

Enhancement of heavy ion track-etching in polyimide membranes with organic solvents.

作者信息

Froehlich Kristina, Scheuerlein Martin Christoph, Ali Mubarak, Nasir Saima, Ensinger Wolfgang

机构信息

Department of Material- and Geo-Sciences, Materials Analysis, Technische Universität Darmstadt, Alarich-Weiss-Str. 02, D-64287 Darmstadt, Germany.

Materials Research Department, GSI Helmholtzzentrum für Schwerionenforschung, D-64291, Darmstadt, Germany.

出版信息

Nanotechnology. 2021 Nov 2;33(4). doi: 10.1088/1361-6528/ac2f5a.

Abstract

The effect of organic solvents on the ion track-etching of polyimide (PI) membranes is studied to enhance the nanopore fabrication process and the control over pore diameter growth. To this end, two approaches are employed to investigate the influence of organic solvents on the nanopore fabrication in PI membranes. In the first approach, the heavy ion irradiated PI samples are pretreated with organic solvents and then chemically etched with sodium hypochlorite (NaOCl) solution, resulting up to ∼4.4 times larger pore size compared to untreated ones. The second approach is based on a single-step track-etching process where the etchant (NaOCl) solution contains varying amounts of organic solvent (by vol%). The experimental data shows that a significant increase in both the bulk-etch and track-etch rates is observed by using the etchant mixture, which leads to ∼47% decrease in the nanopore fabrication time. This enhancement of nanopore fabrication process in PI membranes would open up new opportunities for their implementation in various potential applications.

摘要

研究了有机溶剂对聚酰亚胺(PI)膜离子径迹蚀刻的影响,以改进纳米孔制造工艺并控制孔径增长。为此,采用两种方法研究有机溶剂对PI膜纳米孔制造的影响。在第一种方法中,对重离子辐照的PI样品先用有机溶剂进行预处理,然后用次氯酸钠(NaOCl)溶液进行化学蚀刻,与未处理的样品相比,孔径增大了约4.4倍。第二种方法基于单步径迹蚀刻工艺,其中蚀刻剂(NaOCl)溶液含有不同体积百分比的有机溶剂。实验数据表明,使用蚀刻剂混合物时,体蚀刻速率和径迹蚀刻速率均显著提高,这使得纳米孔制造时间减少了约47%。PI膜纳米孔制造工艺的这种改进将为其在各种潜在应用中的实施开辟新的机会。

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