Mahrous Amr A, Ellakany Passent, Abualsaud Reem, Al-Thobity Ahmad M, Akhtar Sultan, Siddiqui Intisar A, Gad Mohammed M
Department of Substitutive Dental Sciences, College of Dentistry, Imam Abdulrahman Bin Faisal University, Dammam, Saudi Arabia.
Department of Biophysics, Institute for Research and Medical Consultations, Imam Abdulrahman Bin Faisal University, Dammam, Saudi Arabia.
J Prosthodont. 2022 Jul;31(6):529-536. doi: 10.1111/jopr.13444. Epub 2021 Nov 10.
To evaluate the effect of different polishing pastes with different particle sizes on the surface finish of two different CAD/CAM ceramics.
A total of 128 specimens were prepared of two CAD/CAM ceramics: lithium disilicate (12.4 × 14.5 × 2 mm) and monolithic zirconia (17.5 × 12.5 × 2.5 mm). They were divided randomly into 8 groups according to surface treatment (n = 8). Group 1 (control) was left as received after crystallization or sintering with no further surface treatment; Group 2 (glazed); Group 3 (positive control), where specimens were polished using standardized surface treatment (medium grit silicon carbide discs, rubber cup and pumice slurry, then rubber cup and toothpaste). For groups 4 to 8, in addition to silicon carbide and pumice slurry polishing, specimens were further polished using a diamond paste (DP), and polishing pastes of microzirconia (MZ), nanosilica (NS), nanodiamond (ND), and nanozirconia (NZ), respectively. Surface roughness (R ) was measured using noncontact profilometer. The mean values were compared using ANOVA and Post Hoc Tukey's test (α = 0.05). Specimens' surfaces were studied using a scanning electron microscope (SEM).
Positive control group and MZ exhibited significant R of lithium disilicate compared to control (p ˂ 0.001), glazed (p = 0.001), DPs (p = 0.002), NS (p ˂ 0.001), ND (p ˂ 0.001), and NZ (p = 0.002). In the case of zirconia, positive control showed a significantly higher R compared to all other groups (p ˂ 0.001). No statistical difference was found between all other polishing techniques (positive control, glazed, DPs, NS, ND, MZ, and NZ) (p > 0.05).
Polishing with ND, NZ, and NS lab-formulated pastes produced surfaces with comparable smoothness to control and glazed specimens for lithium disilicate and zirconia ceramic materials.
评估不同粒径的不同抛光膏对两种不同的计算机辅助设计/计算机辅助制造(CAD/CAM)陶瓷表面光洁度的影响。
制备了两种CAD/CAM陶瓷的共128个试样:二硅酸锂(12.4×14.5×2mm)和整体式氧化锆(17.5×12.5×2.5mm)。根据表面处理将它们随机分为8组(每组n = 8)。第1组(对照组)在结晶或烧结后按原样保留,不进行进一步的表面处理;第2组(上釉);第3组(阳性对照组),试样采用标准化表面处理进行抛光(中粒度碳化硅盘、橡胶杯和浮石糊剂,然后是橡胶杯和牙膏)。对于第4至8组,除了碳化硅和浮石糊剂抛光外,试样还分别使用金刚石膏(DP)以及微氧化锆(MZ)、纳米二氧化硅(NS)、纳米金刚石(ND)和纳米氧化锆(NZ)抛光膏进行进一步抛光。使用非接触式轮廓仪测量表面粗糙度(R)。使用方差分析和事后检验的Tukey检验(α = 0.05)比较平均值。使用扫描电子显微镜(SEM)研究试样表面。
与对照组(p<0.001)、上釉组(p = 0.001)、DP组(p = 0.002)、NS组(p<0.001)、ND组(p<0.001)和NZ组(p = 0.002)相比,阳性对照组和MZ组的二硅酸锂的R值显著。对于氧化锆,阳性对照组的R值显著高于所有其他组(p<0.001)。在所有其他抛光技术(阳性对照、上釉、DP、NS、ND、MZ和NZ)之间未发现统计学差异(p>0.05)。
对于二硅酸锂和氧化锆陶瓷材料,使用ND、NZ和NS实验室配制的抛光膏抛光后的表面光滑度与对照组和上釉试样相当。