Huang Ben, Li Guodong, Duan Bo, Li Wenjuan, Zhai Pengcheng, Goddard William A
State Key Laboratory of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Wuhan 430070, China.
Hubei Key Laboratory of Theory and Application of Advanced Materials Mechanics, Wuhan University of Technology, Wuhan 430070, China.
ACS Appl Mater Interfaces. 2021 Dec 8;13(48):57629-57637. doi: 10.1021/acsami.1c18583. Epub 2021 Nov 22.
In addition to thermoelectric (TE) performance tuning through defect or strain engineering, progress in mechanical research is of increasing importance to wearable applications of bismuth telluride (BiTe) TE semiconductors, which are limited by poor deformability. For improving dislocation-controlled deformability, we clarify an order-tuned energy-dissipation strategy that facilitates large deformation through multilayer alternating slippage and stacking fault destabilization. Given that energy dissipation and dislocation motions are governed by van der Waals sacrificial bond (SB) behavior, molecular dynamics simulation is implemented to reveal the relation between the shear deformability and lattice order changes in BiTe crystals. Using the disorder parameter () that is defined according to the configurational energy distribution, the results of strain rates and initial crack effects show how the proper design of the initial structure and external conditions can suppress strain localization that would cause structural failure from the lack of energy dissipation, resulting in large homogeneous deformation of BiTe nanocrystals. This study uncovers the essence of the tuning mechanism in which highly deformable BiTe crystals should become disordered as slowly as possible until fracture. This highlights the role of the substructure evolution of SB-defect synergy that facilitates energy dissipation and performance stability during slipping. The disorder parameter provides a bridge between micro/local mechanics and fracture strain, hinting at the possible mechanical improvement of BiTe semiconductors for designing flexible TE devices through order tuning and energy dissipation.
除了通过缺陷或应变工程来调整热电(TE)性能外,机械性能研究的进展对于碲化铋(BiTe)TE半导体的可穿戴应用越来越重要,因为其可穿戴应用受到可变形性差的限制。为了提高位错控制的可变形性,我们阐明了一种有序调整的能量耗散策略,该策略通过多层交替滑移和堆垛层错失稳来促进大变形。鉴于能量耗散和位错运动受范德华牺牲键(SB)行为的控制,我们进行了分子动力学模拟,以揭示BiTe晶体中剪切可变形性与晶格有序变化之间的关系。使用根据构型能量分布定义的无序参数(),应变率和初始裂纹效应的结果表明,初始结构和外部条件的合理设计如何能够抑制应变局部化,否则应变局部化会因缺乏能量耗散而导致结构失效,从而使BiTe纳米晶体实现大的均匀变形。本研究揭示了高可变形性的BiTe晶体应尽可能缓慢地无序化直至断裂这一调整机制的本质。这突出了SB缺陷协同作用的亚结构演化在滑移过程中促进能量耗散和性能稳定性的作用。无序参数为微观/局部力学与断裂应变之间架起了一座桥梁,暗示了通过有序调整和能量耗散来设计柔性TE器件时BiTe半导体可能的机械性能改善。