Sorbonne Université, CNRS, Laboratoire d'Archéologie Moléculaire et Structurale (LAMS), Paris, France.
M4I, Faculty of Science and Engineering, Maastricht University, Maastricht, The Netherlands.
J Mass Spectrom. 2022 Jan;57(1):e4803. doi: 10.1002/jms.4803.
Time-of-flight secondary ion mass spectrometry (TOF-SIMS) imaging is a surface analysis technique that identifies and spatially resolves the chemical composition of a sample with a lateral resolution of less than 1 μm. Depth analyses can also be performed over thicknesses of several microns. In the case of a painting cross section, for example, TOF-SIMS can identify the organic composition, by detecting molecular ions and fragments of binders, as well as the mineral composition of most of the pigments. Importantly, the technique is almost not destructive and is therefore increasingly used in cultural heritage research such as the analysis of painting samples, especially old paintings. In this review, state of the art of TOF-SIMS analysis methods will be described with a particular focus on tuning the instruments for the analysis of painting cross sections and with several examples from the literature showing the added value of this technique when studying cultural heritage samples.
飞行时间二次离子质谱（TOF-SIMS）成像技术是一种表面分析技术，它可以识别和空间分辨样品的化学组成，具有小于 1μm 的横向分辨率。深度分析也可以在几微米的厚度上进行。例如，在绘画横截面的情况下，TOF-SIMS 可以通过检测结合剂的分子离子和碎片以及大多数颜料的矿物成分来识别有机成分。重要的是，该技术几乎没有破坏性，因此越来越多地用于文化遗产研究，例如绘画样本的分析，特别是旧画的分析。在这篇综述中，将描述 TOF-SIMS 分析方法的最新技术，特别关注调整仪器以分析绘画横截面，并通过文献中的几个示例展示了该技术在研究文化遗产样本时的附加值。
