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扫描探针光刻技术:现状与未来展望

Scanning Probe Lithography: State-of-the-Art and Future Perspectives.

作者信息

Fan Pengfei, Gao Jian, Mao Hui, Geng Yanquan, Yan Yongda, Wang Yuzhang, Goel Saurav, Luo Xichun

机构信息

Centre for Precision Manufacturing, Department of DMEM, University of Strathclyde, Glasgow G1 1XQ, UK.

Key Laboratory of Biomass Chemical Engineering of Ministry of Education, College of Chemical and Biological Engineering, Zhejiang University, Hangzhou 310027, China.

出版信息

Micromachines (Basel). 2022 Jan 29;13(2):228. doi: 10.3390/mi13020228.

DOI:10.3390/mi13020228
PMID:35208352
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC8878409/
Abstract

High-throughput and high-accuracy nanofabrication methods are required for the ever-increasing demand for nanoelectronics, high-density data storage devices, nanophotonics, quantum computing, molecular circuitry, and scaffolds in bioengineering used for cell proliferation applications. The scanning probe lithography (SPL) nanofabrication technique is a critical nanofabrication method with great potential to evolve into a disruptive atomic-scale fabrication technology to meet these demands. Through this timely review, we aspire to provide an overview of the SPL fabrication mechanism and the state-the-art research in this area, and detail the applications and characteristics of this technique, including the effects of thermal aspects and chemical aspects, and the influence of electric and magnetic fields in governing the mechanics of the functionalized tip interacting with the substrate during SPL. Alongside this, the review also sheds light on comparing various fabrication capabilities, throughput, and attainable resolution. Finally, the paper alludes to the fact that a majority of the reported literature suggests that SPL has yet to achieve its full commercial potential and is currently largely a laboratory-based nanofabrication technique used for prototyping of nanostructures and nanodevices.

摘要

对于纳米电子学、高密度数据存储设备、纳米光子学、量子计算、分子电路以及生物工程中用于细胞增殖应用的支架等不断增长的需求,需要高通量和高精度的纳米制造方法。扫描探针光刻(SPL)纳米制造技术是一种关键的纳米制造方法,极有可能发展成为一种颠覆性的原子尺度制造技术以满足这些需求。通过此次及时的综述,我们旨在概述SPL制造机制以及该领域的最新研究,并详细介绍该技术的应用和特性,包括热学和化学方面的影响,以及在SPL过程中电场和磁场对功能化探针与基底相互作用力学的影响。与此同时,该综述还对各种制造能力、产量和可实现的分辨率进行了比较。最后,本文指出,大多数已报道的文献表明SPL尚未实现其全部商业潜力,目前在很大程度上仍是一种基于实验室的纳米制造技术,用于纳米结构和纳米器件的原型制作。

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