Yamasue Kohei, Cho Yasuo
Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577, Japan.
Nanomaterials (Basel). 2022 Feb 26;12(5):794. doi: 10.3390/nano12050794.
Scanning nonlinear dielectric microscopy (SNDM) is a near-field microwave-based scanning probe microscopy method with a wide variety of applications, especially in the fields of dielectrics and semiconductors. This microscopy method has often been combined with contact-mode atomic force microscopy (AFM) for simultaneous topography imaging and contact force regulation. The combination SNDM with intermittent contact AFM is also beneficial for imaging a sample prone to damage and using a sharp microscopy tip for improving spatial resolution. However, SNDM with intermittent contact AFM can suffer from a lower signal-to-noise (S/N) ratio than that with contact-mode AFM because of the shorter contact time for a given measurement time. In order to improve the S/N ratio, we apply boxcar averaging based signal acquisition suitable for SNDM with intermittent contact AFM. We develop a theory for the S/N ratio of SNDM and experimentally demonstrate the enhancement of the S/N ratio in SNDM combined with peak-force tapping (a trademark of Bruker) AFM. In addition, we apply the proposed method to the carrier concentration distribution imaging of atomically thin van der Waals semiconductors. The proposed method clearly visualizes an anomalous electron doping effect on few-layer Nb-doped MoS. The proposed method is also applicable to other scanning near-field microwave microscopes combined with peak-force tapping AFM such as scanning microwave impedance microscopy. Our results indicate the possibility of simultaneous nanoscale topographic, electrical, and mechanical imaging even on delicate samples.
扫描非线性介电显微镜(SNDM)是一种基于近场微波的扫描探针显微镜方法,具有广泛的应用,特别是在介电体和半导体领域。这种显微镜方法经常与接触模式原子力显微镜(AFM)结合使用,以实现同步形貌成像和接触力调节。将SNDM与间歇接触式AFM相结合,对于成像易于损坏的样品以及使用尖锐的显微镜尖端来提高空间分辨率也很有好处。然而,由于在给定测量时间内接触时间较短,与接触模式AFM相比,间歇接触式AFM的SNDM可能具有较低的信噪比(S/N)。为了提高信噪比,我们应用了适用于间歇接触式AFM的SNDM的基于箱式平均的信号采集方法。我们推导了SNDM信噪比的理论,并通过实验证明了与峰值力敲击(布鲁克的商标)AFM相结合的SNDM中信噪比的提高。此外,我们将所提出的方法应用于原子级薄范德华半导体的载流子浓度分布成像。所提出的方法清晰地显示了对几层Nb掺杂MoS的异常电子掺杂效应。所提出的方法也适用于其他与峰值力敲击AFM相结合的扫描近场微波显微镜,如扫描微波阻抗显微镜。我们的结果表明,即使在 delicate 样品上也有可能同时进行纳米级形貌、电学和力学成像。