Jung Eilho, Park Jin Cheol, Seo Yu-Seong, Kim Ji-Hee, Hwang Jungseek, Lee Young Hee
Center for Integrated Nanostructure Physics (CINAP), Institute for Basic Science (IBS), Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea.
Department of Physics, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea.
Sci Rep. 2022 Mar 16;12(1):4543. doi: 10.1038/s41598-022-08692-1.
Although large exciton binding energies of typically 0.6-1.0 eV are observed for monolayer transition metal dichalcogenides (TMDs) owing to strong Coulomb interaction, multilayered TMDs yield relatively low exciton binding energies owing to increased dielectric screening. Recently, the ideal carrier-multiplication threshold energy of twice the bandgap has been realized in multilayered semiconducting 2H-MoTe with a conversion efficiency of 99%, which suggests strong Coulomb interaction. However, the origin of strong Coulomb interaction in multilayered 2H-MoTe, including the exciton binding energy, has not been elucidated to date. In this study, unusually large exciton binding energy is observed through optical spectroscopy conducted on CVD-grown 2H-MoTe. To extract exciton binding energy, the optical conductivity is fitted using the Lorentz model to describe the exciton peaks and the Tauc-Lorentz model to describe the indirect and direct bandgaps. The exciton binding energy of 4 nm thick multilayered 2H-MoTe is approximately 300 meV, which is unusually large by one order of magnitude when compared with other multilayered TMD semiconductors such as 2H-MoS or 2H-MoSe. This finding is interpreted in terms of small exciton radius based on the 2D Rydberg model. The exciton radius of multilayered 2H-MoTe resembles that of monolayer 2H-MoTe, whereas those of multilayered 2H-MoS and 2H-MoSe are large when compared with monolayer 2H-MoS and 2H-MoSe. From the large exciton binding energy in multilayered 2H-MoTe, it is expected to realize the future applications such as room-temperature and high-temperature polariton lasing.
尽管由于强库仑相互作用,单层过渡金属二卤化物(TMDs)通常具有0.6 - 1.0 eV的大激子结合能,但多层TMDs由于介电屏蔽增强,激子结合能相对较低。最近,在多层半导体2H-MoTe中实现了理想的载流子倍增阈值能量,其为带隙的两倍,转换效率为99%,这表明存在强库仑相互作用。然而,多层2H-MoTe中强库仑相互作用的起源,包括激子结合能,迄今为止尚未阐明。在本研究中,通过对化学气相沉积(CVD)生长的2H-MoTe进行光谱学观察,发现了异常大的激子结合能。为了提取激子结合能,使用洛伦兹模型拟合光导率以描述激子峰,并使用陶-洛伦兹模型描述间接和直接带隙。4纳米厚的多层2H-MoTe的激子结合能约为300毫电子伏特,与其他多层TMD半导体(如2H-MoS或2H-MoSe)相比,异常大一个数量级。这一发现基于二维里德堡模型,从小激子半径的角度进行了解释。多层2H-MoTe的激子半径与单层2H-MoTe的相似,而多层2H-MoS和2H-MoSe的激子半径与单层2H-MoS和2H-MoSe相比则较大。基于多层2H-MoTe中的大激子结合能,有望实现室温及高温极化激元激光等未来应用。