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应变工程过渡金属二硫属化物中的光激发动力学与长寿命激子

Photoexcitation Dynamics and Long-Lived Excitons in Strain-Engineered Transition Metal Dichalcogenides.

作者信息

Mondal Navendu, Azam Nurul, Gartstein Yuri N, Mahjouri-Samani Masoud, Malko Anton V

机构信息

Department of Physics, The University of Texas at Dallas, Richardson, TX, 75080, USA.

Department of Electrical and Computer Engineering, Auburn University, Auburn, AL, 36849, USA.

出版信息

Adv Mater. 2022 Jun;34(23):e2110568. doi: 10.1002/adma.202110568. Epub 2022 Apr 30.

Abstract

Strain-engineering in 2D transition metal dichalcogenide (TMD) semiconductors has garnered intense research interest in tailoring the optical properties via strain-induced modifications of the electronic bands in TMDs, while its impact on the exciton dynamics remains less understood. To address this, an extensive study of transient optical absorption (TA) of both W- and Mo-based single-crystalline monolayer TMDs grown by a recently developed laser-assisted evaporation method is performed. All spectral features of the monolayers as grown on fused silica substrates exhibit appreciable redshifts relating to the existence of strain due to growth conditions. Moreover, these systems exhibit a dramatic slowing down of exciton dynamics (100s of picoseconds to few nanoseconds) with an increase in carrier densities, which strongly contrasts with the monolayers in their freestanding form as well as in comparison with more traditionally grown TMDs. The observations are related to the modifications of the electronic bands as expected from the strain and associated population of the intervalley dark excitons that can now interplay with intravalley excitations. These findings are consistent across both the Mo- and W-based TMD families, providing key information about the influence of the growth conditions on the nature of optical excitations and fostering emerging optoelectronic applications of monolayer TMDs.

摘要

二维过渡金属二硫属化物(TMD)半导体中的应变工程通过应变诱导TMDs中电子能带的变化来调整光学性质,已引起了广泛的研究兴趣,但其对激子动力学的影响仍不太清楚。为了解决这个问题,我们对通过最近开发的激光辅助蒸发法生长的基于W和Mo的单晶单层TMDs的瞬态光吸收(TA)进行了广泛研究。在熔融石英衬底上生长的单层膜的所有光谱特征都表现出与生长条件引起的应变相关的明显红移。此外,随着载流子密度的增加,这些系统的激子动力学显著减慢(从几百皮秒到几纳秒),这与独立形式的单层膜以及与传统生长的TMDs相比形成了强烈对比。这些观察结果与应变预期的电子能带变化以及现在可以与谷内激发相互作用的谷间暗激子的相关填充有关。这些发现对于基于Mo和W的TMD家族都是一致的,提供了关于生长条件对光学激发性质影响的关键信息,并促进了单层TMDs新兴的光电子应用。

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