IEEE Trans Ultrason Ferroelectr Freq Control. 2022 Jun;69(6):2214-2221. doi: 10.1109/TUFFC.2022.3165047. Epub 2022 May 26.
An ultralow program/erase voltage ( |V| = 4 V) is demonstrated by using an antiferroelectric-ferroelectric field-effect transistor (AFE-FE-FET) through a multipeak coercive E -field ( E ) concept for a four-level stable state with outstanding endurance (>10 cycles) and data retention (>10 s at 65 °C). The mixture of ferroelectric (FE) and AFE domains can provide stable multistate and data storage with zero bias for multilevel cell (MLC) applications. HfZrO (HZO) with AFE-FE assembles an orthorhombic/tetragonal (o/t) phase composition and is achieved by [Zr] modulation in an HZO system. MLC characteristics not only improve high-density nonvolatile memory (NVM) but are also beneficial to neuromorphic device applications.
通过使用反铁电-铁电场效应晶体管 (AFE-FE-FET) 实现超低压程/擦除电压 (|V| = 4 V),通过多峰矫顽电场 (E) 概念实现具有出色耐久性 (>10 个循环) 和数据保持力 (>10 s 在 65 °C) 的四电平稳定状态。铁电 (FE) 和 AFE 畴的混合物可为多电平单元 (MLC) 应用提供零偏置的稳定多态和数据存储。具有 AFE-FE 组装的 HfZrO (HZO) 形成正交/四方 (o/t) 相组成,并通过 HZO 系统中的 [Zr] 调制来实现。MLC 特性不仅改善了高密度非易失性存储器 (NVM),而且还有益于神经形态器件应用。