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用于非易失性存储应用的二维CIPS-InSe范德华异质结构铁电场效应晶体管

Two-Dimensional CIPS-InSe van der Waal Heterostructure Ferroelectric Field Effect Transistor for Nonvolatile Memory Applications.

作者信息

Singh Prashant, Baek Sungpyo, Yoo Hyun Ho, Niu Jingjie, Park Jin-Hong, Lee Sungjoo

机构信息

SKKUAdvanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon 440-746, Korea.

Department of Nano Engineering, Sungkyunkwan University, Suwon 440-746, Korea.

出版信息

ACS Nano. 2022 Apr 26;16(4):5418-5426. doi: 10.1021/acsnano.1c09136. Epub 2022 Mar 2.

DOI:10.1021/acsnano.1c09136
PMID:35234041
Abstract

Channel current conduction modulation with the spontaneous polarization of ferroelectric films in ferroelectric field-effect transistors (FeFETs) has been widely investigated. Low interface quality and thermodynamic instability owing to the presence of dangling bonds in the conventional ferroelectrics have limited the memory retention and endurance of FeFETs. This, in turn, prevents their commercialization. However, the atomically thin nature of 2D ferroelectric, semiconducting, and insulating films facilitate the achievement of trap-free interfaces as van der Waal heterostructures (vdWHs) to develop FeFETs with long data retention and endurance characteristics. Here, we demonstrate a 2D vdWH FeFET fabricated with ferroelectric CuInPS (CIPS), hexagonal boron nitride (h-BN) as the dielectric, and InSe as the ferroelectric semiconductor channel. The device shows an excellent performance as nonvolatile memory (NVM) with its large memory window (4.6 V at a voltage sweep of 5 V), high drain current on/off ratio (>10), high endurance, and long data retention (>10 s). These results demonstrate the considerable potential of vdWHs for the development of FeFETs for logic and NVM applications.

摘要

铁电场效应晶体管(FeFET)中利用铁电薄膜的自发极化进行沟道电流传导调制已得到广泛研究。由于传统铁电体中存在悬空键,导致界面质量低和热力学不稳定性,限制了FeFET的存储保持能力和耐久性。这反过来又阻碍了它们的商业化。然而,二维铁电、半导体和绝缘薄膜的原子级薄特性有助于实现无陷阱界面,作为范德华异质结构(vdWHs)来开发具有长数据保持和耐久性特性的FeFET。在此,我们展示了一种二维vdWH FeFET,它由铁电CuInPS(CIPS)、作为电介质的六方氮化硼(h-BN)和作为铁电半导体沟道的InSe制成。该器件作为非易失性存储器(NVM)表现出优异的性能,具有大的存储窗口(在5 V电压扫描下为4.6 V)、高漏极电流开/关比(>10)、高耐久性和长数据保持时间(>10 s)。这些结果证明了vdWHs在开发用于逻辑和NVM应用的FeFET方面具有巨大潜力。

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