通过喷雾热解沉积的化学还原氧化石墨烯薄膜的比较研究。

A Comparative Investigation of Chemically Reduced Graphene Oxide Thin Films Deposited via Spray Pyrolysis.

作者信息

Bargaoui Ilhem, Bitri Nabila, Ménard Jean-Michel

机构信息

Faculty of Sciences of Tunis, University of Tunis El Manar, Tunis 1068, Tunisia.

National Engineering School of Tunis, Photovoltaic and Semiconductor Materials Laboratory, University of Tunis El Manar, Tunis 1002, Tunisia.

出版信息

ACS Omega. 2022 Mar 29;7(14):11973-11979. doi: 10.1021/acsomega.2c00108. eCollection 2022 Apr 12.

Abstract

We present a comparative investigation between thin films of graphene oxide (GO) and chemically reduced graphene oxide (rGO) deposited onto glass substrates via spray pyrolysis. Two reduction techniques are investigated: (1) the exposition of a sprayed layer of GO to vapors of hydrazine hydrate to produce rGO and (2) the addition of liquid hydrazine hydrate to a suspended GO solution, which is then sprayed onto a substrate to produce rGO. Three different spectroscopy techniques, Raman, Fourier transform infrared, and UV-Vis-NIR, show that the two reduced samples have less lattice disorder in comparison to GO, with rGO having the highest degree of reduction. Interestingly, topography characterization by atomic force microscopy reveals a morphological change occurring during the exposure to hydrazine hydrate vapors, resulting in a thickness of 110 nm for the rGO film, which is a factor of 16 larger than rGO and GO. Finally, - measurements show a significant decrease of the GO's resistivity after the reduction process, where rGO features a resistivity 90 times lower than rGO, confirming that rGO has the highest degree of reduction. Our results indicate that the reduction process for rGO is susceptible to introducing intercalated water molecules in the material while the fabrication technique for rGO is a suitable route to obtain a material with minimal lattice disorder and properties approaching those of graphene.

摘要

我们展示了通过喷雾热解沉积在玻璃基板上的氧化石墨烯(GO)薄膜与化学还原氧化石墨烯(rGO)薄膜之间的对比研究。研究了两种还原技术:(1)将喷涂的GO层暴露于水合肼蒸汽中以制备rGO;(2)向悬浮的GO溶液中加入液态水合肼,然后将其喷涂到基板上以制备rGO。拉曼光谱、傅里叶变换红外光谱和紫外-可见-近红外光谱这三种不同的光谱技术表明,与GO相比,两种还原样品的晶格无序度更低,其中rGO的还原程度最高。有趣的是,原子力显微镜的形貌表征揭示了在暴露于水合肼蒸汽过程中发生的形态变化,导致rGO薄膜的厚度为110 nm,这比rGO和GO厚16倍。最后, - 测量结果表明还原过程后GO的电阻率显著降低,其中rGO的电阻率比rGO低90倍,证实rGO具有最高的还原程度。我们的结果表明,rGO的还原过程容易在材料中引入插层水分子,而rGO的制备技术是获得具有最小晶格无序度且性能接近石墨烯的材料的合适途径。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/05f3/9016891/364a97f08195/ao2c00108_0002.jpg

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