Wu Ning, Zhang Xue-Jing, Liu Bang-Gui
Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences Beijing 100190 China
School of Physical Sciences, University of Chinese Academy of Sciences Beijing 100190 China.
RSC Adv. 2020 Dec 15;10(72):44088-44095. doi: 10.1039/d0ra08745a. eCollection 2020 Dec 9.
Strong Rashba effects at semiconductor surfaces and interfaces have attracted great attention for basic scientific exploration and practical applications. Here, we show through first-principles investigation that applying biaxial stress can cause tunable and giant Rashba effects in ultrathin KTaO (KTO) (001) films with the most stable surfaces. When increasing the in-plane compressive strain to -5%, the Rashba spin splitting energy reaches = 140 meV, corresponding to the Rashba coupling constant = 1.3 eV Å. We investigate its strain-dependent crystal structures, energy bands, and related properties, and thereby elucidate the mechanism for the giant Rashba effects. Further calculations show that the giant Rashba spin splitting can remain or be enhanced when capping layer and/or Si substrate are added, and a SrTiO capping can make the Rashba spin splitting energy reach the record 190 meV. Furthermore, it is elucidated that strong circular photogalvanic effect can be achieved for spin-polarized photocurrents in the KTO thin films or related heterostructures, which is promising for future spintronic and optoelectronic applications.
半导体表面和界面处的强 Rashba 效应因其基础科学探索和实际应用而备受关注。在此,我们通过第一性原理研究表明,施加双轴应力可在具有最稳定表面的超薄 KTaO(KTO)(001)薄膜中引起可调谐的巨大 Rashba 效应。当将面内压缩应变增加到 -5% 时,Rashba 自旋分裂能达到 = 140 meV,对应于 Rashba 耦合常数 = 1.3 eV Å。我们研究了其与应变相关的晶体结构、能带及相关性质,从而阐明了巨大 Rashba 效应的机制。进一步计算表明,添加盖帽层和/或 Si 衬底时,巨大的 Rashba 自旋分裂可以保留或增强,并且 SrTiO 盖帽可使 Rashba 自旋分裂能达到创纪录的 190 meV。此外,还阐明了在 KTO 薄膜或相关异质结构中,对于自旋极化光电流可实现强圆光电流效应,这对未来的自旋电子学和光电子学应用具有重要意义。