Santiago Svette Reina Merden, Caigas Septem P, Lin Tzu-Neng, Yuan Chi-Tsu, Shen Ji-Lin, Chiu Ching-Hsueh, Kuo Hao-Chung
Department of Physics and Center for Nanotechnology, Chung Yuan Christian University Chung-Li 32023 Taiwan
Department of Electronic Engineering, Chung Yuan Christian University Chung-Li 32023 Taiwan.
RSC Adv. 2018 Apr 24;8(28):15399-15404. doi: 10.1039/c7ra13108a. eCollection 2018 Apr 23.
We propose a tunnel-injection structure, in which WS quantum dots (QDs) act as the injector and InGaN/GaN quantum wells (QWs) act as the light emitters. Such a structure with different barrier thicknesses has been characterized using steady-state and time-resolved photoluminescence (PL). A simultaneous enhancement of the PL intensity and PL decay time for the InGaN QW were observed after transfer of charge carriers from the WS-QD injector to the InGaN-QW emitter. The tunneling time has been extracted from the time-resolved PL, which increases as the barrier thickness is increased. The dependence of the tunneling time on the barrier thickness is in good agreement with the prediction of the semiclassical Wentzel-Kramers-Brillouin model, confirming the mechanism of the tunnel injection between WS QDs and InGaN QWs.
我们提出了一种隧道注入结构,其中WS量子点(QDs)作为注入器,InGaN/GaN量子阱(QWs)作为发光体。已使用稳态和时间分辨光致发光(PL)对具有不同势垒厚度的这种结构进行了表征。在电荷载流子从WS量子点注入器转移到InGaN量子阱发光体之后,观察到InGaN量子阱的PL强度和PL衰减时间同时增强。已从时间分辨PL中提取了隧穿时间,其随着势垒厚度的增加而增加。隧穿时间对势垒厚度的依赖性与半经典的温策尔-克拉默斯-布里渊模型的预测高度吻合,证实了WS量子点与InGaN量子阱之间的隧道注入机制。