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硅掺杂砷化镓纳米线的光降解

Photodegradation of Si-doped GaAs nanowire.

作者信息

Pimenta A C S, Limborço H, González J C, Cifuentes N, Ramos Sérgio L L M, Matinaga Franklin M

机构信息

Photonics Laboratory, Physics Department, UFMG Belo Horizonte Brazil

Microscopy Centre of UFMG, UFMG Belo Horizonte Brazil.

出版信息

RSC Adv. 2019 Dec 2;9(67):39488-39494. doi: 10.1039/c9ra06365j. eCollection 2019 Nov 27.

Abstract

Researching optical effects in nanowires may require a high pump intensity which under ambient conditions can degrade nanowires due to thermal oxidation. In this work we investigated the photodegradation of a single Si-doped GaAs nanowire by laser heating in air. To understand the changes that occurred on the nanowire we carried out Raman spectroscopy, scanning electron microscopy, energy dispersive X-ray spectroscopy, and photoluminescence spectroscopy in laser damaged regions as well as in non-affected ones. From Raman Stokes and anti-Stokes measurements we estimated the local temperature that the oxidation process of the nanowire (NW) surface starts at as 661 K, resulting in two new Raman modes at 200 cm and 259 cm. Scanning electron microscopy and energy dispersive X-ray spectroscopy measurements showed a significant loss of arsenic in the oxidized regions, but no erosion of the nanowire. Micro-photoluminescence measurements showed the near-band-edge emission of GaAs along the nanowire, as well as a new emission band at 755 nm corresponding to polycrystalline β-GaO formation. Our results also indicate that neither amorphous As nor crystalline As were deposited on the surface of the nanowire. Combining different experimental techniques, this study showed the formation of polycrystalline β-GaO by oxidation of the nanowire surface and the limits for performing spectroscopic investigations on individual GaAs NWs under ambient air conditions.

摘要

研究纳米线中的光学效应可能需要高泵浦强度,在环境条件下,这可能会由于热氧化而使纳米线降解。在这项工作中,我们研究了在空气中通过激光加热对单根硅掺杂砷化镓纳米线的光降解。为了了解纳米线上发生的变化,我们在激光损伤区域以及未受影响的区域进行了拉曼光谱、扫描电子显微镜、能量色散X射线光谱和光致发光光谱分析。通过拉曼斯托克斯和反斯托克斯测量,我们估计纳米线(NW)表面氧化过程开始时的局部温度为661K,这导致在200cm和259cm处出现两种新的拉曼模式。扫描电子显微镜和能量色散X射线光谱测量表明,氧化区域中砷有显著损失,但纳米线没有侵蚀现象。微光致发光测量显示了沿纳米线的砷化镓近带边发射,以及对应于多晶β-GaO形成的755nm处的新发射带。我们的结果还表明,纳米线表面既没有沉积非晶态砷也没有沉积晶态砷。结合不同的实验技术,这项研究表明纳米线表面氧化形成了多晶β-GaO,以及在环境空气条件下对单个砷化镓纳米线进行光谱研究的局限性。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/96f1/9076065/0e484c697e64/c9ra06365j-f1.jpg

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