Zheng Li, Cheng Xinhong, Ye Peiyi, Shen Lingyan, Wang Qian, Zhang Dongliang, Gu Ziyue, Zhou Wen, Wu Dengpeng, Yu Yuehui
State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences Changning Road 865 Shanghai 200050 P. R. China
University of Chinese Academy of Sciences Beijing 100049 P. R. China.
RSC Adv. 2018 Jan 4;8(3):1477-1480. doi: 10.1039/c7ra11654c. eCollection 2018 Jan 2.
Chemical vapor deposition (CVD) from gaseous hydrocarbon sources has shown great promise for large-scale graphene growth, but the high growth temperature, typically 1050 °C, requires precise and expensive equipment and makes the direct deposition of graphene in electronic device manufacturing processes unfeasible due to the severe physical damage to substrates. Here we demonstrate a facile route to synthesize graphene by catalytic metal engineering and thermal processing. The engineered catalytic metal (copper) with carbon implantation could lower the synthetic temperature to 700 °C. And the resulting graphene shows few defects, uniform morphology and high carrier mobility, comparable to CVD graphene grown at 1050 °C. This technique could expand the applications of graphene in electronic and optoelectronic device manufacturing and is compatible with conventional microelectronics technology.
来自气态烃源的化学气相沉积(CVD)已显示出在大规模生长石墨烯方面具有巨大潜力,但通常为1050°C的高生长温度需要精确且昂贵的设备,并且由于对衬底造成严重物理损伤,使得在电子器件制造工艺中直接沉积石墨烯变得不可行。在此,我们展示了一种通过催化金属工程和热处理来合成石墨烯的简便方法。经过碳注入的工程催化金属(铜)可将合成温度降低至700°C。所得石墨烯几乎没有缺陷,形态均匀且载流子迁移率高,与在1050°C下生长的CVD石墨烯相当。该技术可扩展石墨烯在电子和光电器件制造中的应用,并且与传统微电子技术兼容。