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二氧化硅颗粒介导单晶石墨烯带在铜(111)箔上的生长。

Silica Particle-Mediated Growth of Single Crystal Graphene Ribbons on Cu(111) Foil.

作者信息

Li Yunqing, Choe Myeonggi, Jin Sunghwan, Luo Da, Bakharev Pavel V, Seong Won Kyung, Ding Feng, Lee Zonghoon, Ruoff Rodney S

机构信息

Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Republic of Korea.

Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Republic of Korea.

出版信息

Small. 2022 Jun;18(24):e2202536. doi: 10.1002/smll.202202536. Epub 2022 May 18.

DOI:10.1002/smll.202202536
PMID:35585685
Abstract

The authors report the growth of micrometer-long single-crystal graphene ribbons (GRs) (tapered when grown above 900 °C, but uniform width when grown in the range 850 °C to 900 °C) using silica particle seeds on single crystal Cu(111) foil. Tapered graphene ribbons grow strictly along the Cu<101> direction on Cu(111) and polycrystalline copper (Cu) foils. Silica particles on both Cu foils form (semi-)molten Cu-Si-O droplets at growth temperatures, then catalyze nucleation and drive the longitudinal growth of graphene ribbons. Longitudinal growth is likely by a vapor-liquid-solid (VLS) mechanism but edge growth (above 900 °C) is due to catalytic activation of ethylene (C H ) and attachment of C atoms or species ("vapor solid" or VS growth) at the edges. It is found, based on the taper angle of the graphene ribbon, that the taper angle is determined by the growth temperature and the growth rates are independent of the particle size. The activation enthalpy (1.73 ± 0.03 eV) for longitudinal ribbon growth on Cu(111) from ethylene is lower than that for VS growth at the edges of the GRs (2.78 ± 0.15 eV) and for graphene island growth (2.85 ± 0.07 eV) that occurs concurrently.

摘要

作者报告了在单晶Cu(111)箔上使用二氧化硅颗粒种子生长微米长的单晶石墨烯带(GRs)(在900℃以上生长时呈锥形,但在850℃至900℃范围内生长时宽度均匀)。锥形石墨烯带在Cu(111)和多晶铜(Cu)箔上严格沿Cu<101>方向生长。两种Cu箔上的二氧化硅颗粒在生长温度下形成(半)熔融的Cu-Si-O液滴,然后催化成核并驱动石墨烯带的纵向生长。纵向生长可能通过气-液-固(VLS)机制,但边缘生长(900℃以上)是由于乙烯(C₂H₄)的催化活化以及C原子或物种(“气-固”或VS生长)在边缘的附着。基于石墨烯带的锥角发现,锥角由生长温度决定,且生长速率与颗粒尺寸无关。在Cu(111)上由乙烯进行纵向带生长的活化焓(1.73±0.03 eV)低于GRs边缘的VS生长(2.78±0.15 eV)以及同时发生的石墨烯岛生长(2.85±0.07 eV)的活化焓。

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