El-Ahmar Semir, Przychodnia Marta, Jankowski Jakub, Prokopowicz Rafał, Ziemba Maciej, Szary Maciej J, Reddig Wiktoria, Jagiełło Jakub, Dobrowolski Artur, Ciuk Tymoteusz
Institute of Physics, Poznan University of Technology, Piotrowo 3, 61-138 Poznan, Poland.
National Centre for Nuclear Research, Andrzeja Soltana 7, 05-400 Otwock, Poland.
Sensors (Basel). 2022 Jul 14;22(14):5258. doi: 10.3390/s22145258.
The ability to precisely measure magnetic fields under extreme operating conditions is becoming increasingly important as a result of the advent of modern diagnostics for future magnetic-confinement fusion devices. These conditions are recognized as strong neutron radiation and high temperatures (up to 350 °C). We report on the first experimental comparison of the impact of neutron radiation on graphene and indium antimonide thin films. For this purpose, a 2D-material-based structure was fabricated in the form of hydrogen-intercalated quasi-free-standing graphene on semi-insulating high-purity on-axis 4H-SiC(0001), passivated with an AlO layer. InSb-based thin films, donor doped to varying degrees, were deposited on a monocrystalline gallium arsenide or a polycrystalline ceramic substrate. The thin films were covered with a SiO insulating layer. All samples were exposed to a fast-neutron fluence of ≈7×1017 cm. The results have shown that the graphene sheet is only moderately affected by neutron radiation compared to the InSb-based structures. The low structural damage allowed the graphene/SiC system to retain its electrical properties and excellent sensitivity to magnetic fields. However, InSb-based structures proved to have significantly more post-irradiation self-healing capabilities when subject to proper temperature treatment. This property has been tested depending on the doping level and type of the substrate.
随着未来磁约束聚变装置现代诊断技术的出现,在极端运行条件下精确测量磁场的能力变得越来越重要。这些条件被认为是强中子辐射和高温(高达350°C)。我们报告了中子辐射对石墨烯和锑化铟薄膜影响的首次实验比较。为此,在半绝缘高纯度轴向4H-SiC(0001)上制备了一种基于二维材料的结构,该结构为氢插层准独立石墨烯形式,并用AlO层钝化。将不同程度施主掺杂的锑化铟基薄膜沉积在单晶砷化镓或多晶陶瓷衬底上。薄膜覆盖有SiO绝缘层。所有样品都暴露在≈7×1017 cm的快中子注量下。结果表明,与锑化铟基结构相比,石墨烯片仅受到中子辐射的中度影响。低结构损伤使石墨烯/碳化硅系统能够保持其电学性能以及对磁场的优异灵敏度。然而,锑化铟基结构在经过适当的温度处理后,被证明具有显著更多的辐照后自愈能力。这一特性已根据掺杂水平和衬底类型进行了测试。