Faculty of Life and Environmental Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki, 305-8577, Japan.
Laboratory of Basic and Applied Molecular Biotechnology, Division of Food Science and Biotechnology, Graduate School of Agriculture, Kyoto University, Gokasho, Uji, Kyoto, 611-0011, Japan.
Sci Rep. 2022 Aug 6;12(1):13516. doi: 10.1038/s41598-022-17462-y.
Fungi are ubiquitously present in our living environment and are responsible for crop and infectious diseases. Developing new antifungal agents is constantly needed for their effective control. Here, we investigated fungal cellular responses to an array of antifungal compounds, including plant- and bacteria-derived antifungal compounds. The pathogenic fungus Aspergillus fumigatus generated reactive oxygen species in its hyphae after exposure to the antifungal compounds thymol, farnesol, citral, nerol, salicylic acid, phenazine-1-carbonic acid, and pyocyanin, as well as under oxidative and high-temperature stress conditions. The production of nitric oxide (NO) was determined using diaminofluorescein-FM diacetate (DAF-FM DA) and occurred in response to antifungal compounds and stress conditions. The application of reactive oxygen species or NO scavengers partly suppressed the inhibitory effects of farnesol on germination. However, NO production was not detected in the hyphae using the Greiss method. An LC/MS analysis also failed to detect DAF-FM-T, a theoretical product derived from DAF-FM DA and NO, in the hyphae after antifungal treatments. Thus, the cellular state after exposure to antifungal agents may be more complex than previously believed, and the role of NO in fungal cells needs to be investigated further.
真菌广泛存在于我们的生活环境中,是导致作物和传染病的罪魁祸首。为了有效控制真菌,我们不断需要开发新的抗真菌药物。在这里,我们研究了真菌细胞对一系列抗真菌化合物的反应,包括植物和细菌来源的抗真菌化合物。致病性真菌烟曲霉在接触到抗真菌化合物百里酚、法呢醇、柠檬醛、橙花醇、水杨酸、吩嗪-1-羧酸和绿脓菌素以及氧化和高温应激条件后,其菌丝会产生活性氧。使用二氨基荧光素 FM 二乙酸酯 (DAF-FM DA) 测定了一氧化氮 (NO) 的产生情况,结果表明 NO 的产生是对抗真菌化合物和应激条件的反应。活性氧或 NO 清除剂的应用部分抑制了法呢醇对发芽的抑制作用。然而,使用格里塞氏法并未在菌丝中检测到 NO 的产生。LC/MS 分析也未能在抗真菌处理后从菌丝中检测到 DAF-FM-T,这是 DAF-FM DA 和 NO 的理论产物。因此,暴露于抗真菌剂后的细胞状态可能比之前认为的更为复杂,需要进一步研究 NO 在真菌细胞中的作用。