Feng Chuangshi, Feng Xiaobin, Guan Zhou, Song Hongquan, Wang Tianli, Liao Weibing, Lu Yang, Zhang Fuxiang
Songshan Lake Materials Laboratory, Dongguan 523808, China.
Hubei Key Laboratory of Theory and Application of Advanced Materials Mechanics, Wuhan University of Technology, Wuhan 430070, China.
Nanomaterials (Basel). 2022 Aug 8;12(15):2722. doi: 10.3390/nano12152722.
Multi-component nitride thin films usually show high hardness and good wear resistance due to the nanoscale structure and solid-solution strengthening effect. However, the state of N atoms in the thin film and its effects on the compressive strength is still unclear. In this work, (AlTiVCr)N multi-component nitride thin films with a face-centered cubic (FCC) structure prepared by the direct current magnetron sputtering method exhibit a superior strength of ~4.5 GPa and final fracture at a strain of ~5.0%. The excellent mechanical properties are attributed to the synergistic effects of the nanocrystalline structure, covalent bonding between N and metal atoms, and interstitial strengthening. Our results could provide an intensive understanding of the relationship between microstructure and mechanical performances for multi-component nitride thin films, which may promote their applications in micro- and nano-devices.
由于纳米级结构和固溶强化效应，多组分氮化物薄膜通常表现出高硬度和良好的耐磨性。然而，薄膜中N原子的状态及其对压缩强度的影响仍不明确。在这项工作中，通过直流磁控溅射法制备的具有面心立方（FCC）结构的（AlTiVCr）N多组分氮化物薄膜表现出约4.5 GPa的优异强度，并在约5.0%的应变下最终断裂。优异的力学性能归因于纳米晶体结构、N与金属原子之间的共价键以及间隙强化的协同效应。我们的结果可以深入了解多组分氮化物薄膜的微观结构与力学性能之间的关系，这可能会促进它们在微纳器件中的应用。
