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使用先进的12英寸浸没式光刻技术进行大规模生动超表面彩色印刷。

Large-scale vivid metasurface color printing using advanced 12-in. immersion photolithography.

作者信息

Khaidarov Egor, Eschimese Damien, Lai Keng Heng, Huang Aihong, Fu Yuan Hsing, Lin Qunying, Paniagua-Dominguez Ramon, Kuznetsov Arseniy I

机构信息

Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, #08-03, Innovis, Singapore, 138634, Singapore.

Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research), 2 Fusionopolis Way, #08-02, Innovis, Singapore, 138634, Singapore.

出版信息

Sci Rep. 2022 Aug 18;12(1):14044. doi: 10.1038/s41598-022-18259-9.

DOI:10.1038/s41598-022-18259-9
PMID:35982212
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC9388524/
Abstract

Nanostructures exhibiting optical resonances (so-called nanoantennas) have strong potential for applications in color printing and filtering with sub-wavelength resolution. While small scale demonstrations of these systems are interesting as a proof-of-concept, their large scale and volume fabrication requires deeper analysis and further development for industrial adoption. Here, we evaluate the color quality produced by large size nanoantenna arrays fabricated on a 12-in. wafer using deep UV immersion photolithography and dry etching processes. The color reproduction and quality are analyzed in context of the CIE color diagram, showing that a vivid and vibrant color palette, almost fully covering the sRGB color space, can be obtained with this mass-manufacturing-ready fabrication process. The obtained results, thus, provide a solid foundation for the potential industrial adoption of this emerging technology and expose the limits and challenges of the process.

摘要

展现出光学共振的纳米结构(即所谓的纳米天线)在亚波长分辨率的彩色印刷和滤波应用方面具有巨大潜力。虽然这些系统的小规模演示作为概念验证很有意思,但它们的大规模和批量制造需要更深入的分析以及进一步的开发,以便实现工业应用。在此,我们评估了使用深紫外浸没光刻和干法蚀刻工艺在12英寸晶圆上制造的大尺寸纳米天线阵列所产生的颜色质量。在CIE色图的背景下对颜色再现和质量进行了分析,结果表明,通过这种可用于大规模制造的工艺,可以获得几乎完全覆盖sRGB颜色空间的鲜艳且充满活力的调色板。因此,所获得的结果为这项新兴技术的潜在工业应用奠定了坚实基础,并揭示了该工艺的局限性和挑战。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/1ddf4ac1186f/41598_2022_18259_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/f1e97ab68c2d/41598_2022_18259_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/8b6b7de8c080/41598_2022_18259_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/1ddf4ac1186f/41598_2022_18259_Fig3_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/f1e97ab68c2d/41598_2022_18259_Fig1_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/8b6b7de8c080/41598_2022_18259_Fig2_HTML.jpg
https://cdn.ncbi.nlm.nih.gov/pmc/blobs/52d8/9388524/1ddf4ac1186f/41598_2022_18259_Fig3_HTML.jpg

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