Department of Physics, Visvesvaraya National Institute of Technology, Nagpur, 440010, India.
Environ Sci Pollut Res Int. 2023 Sep;30(44):98619-98631. doi: 10.1007/s11356-022-22745-y. Epub 2022 Sep 2.
Water pollution caused by organic compounds, generated from different industries, has gained attention worldwide today. In this regard, significant efforts have been made for a suitable dye degradation technology. Zinc oxide (ZnO)-based photocatalysts are considered novel materials to degrade organic effluents in contaminated water. The facile synthesis of Ag/ZnO nanocomposites and its application for the enhanced degradation of indigo carmine (IC) dye under visible light irradiation is reported in this paper. The prepared photocatalysts were characterized using various analytical techniques such as X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), X-ray photoelectron (XPS) spectroscopy, FTIR, Raman, impedance study, UV-Vis, and photoluminescence (PL). Prepared Ag/ZnO nanocomposites were tested for degradation of IC dye in visible light. The degradation efficiency of IC dye was found to be 95.71% in 120 min, with a rate constant of 0.02021 min. This improved photocatalytic activity of Ag/ZnO nanocomposites was mainly due to the absorption of visible light caused by surface plasmon resonance (SPR) derived from Ag nanoparticles (NPs) and electron-hole separation. Radical trapping experiments suggest that holes (h) and superoxide radical (O•) are the key factors in photocatalytic IC dye degradation.
由不同工业产生的有机化合物造成的水污染,如今已引起全球关注。在这方面,人们已经做出了巨大的努力来寻找合适的染料降解技术。氧化锌 (ZnO) 基光催化剂被认为是降解受污染水中有机废水的新型材料。本文报道了简便合成 Ag/ZnO 纳米复合材料及其在可见光照射下增强靛蓝胭脂红 (IC) 染料降解的应用。所制备的光催化剂采用 X 射线衍射 (XRD)、扫描电子显微镜 (SEM)、高分辨率透射电子显微镜 (HRTEM)、X 射线光电子能谱 (XPS)、傅里叶变换红外光谱 (FTIR)、拉曼、阻抗研究、紫外-可见分光光度计 (UV-Vis) 和光致发光 (PL) 等多种分析技术进行了表征。制备的 Ag/ZnO 纳米复合材料用于可见光下 IC 染料的降解。结果表明,在 120 分钟内,IC 染料的降解效率达到 95.71%,速率常数为 0.02021 分钟。Ag/ZnO 纳米复合材料这种增强的光催化活性主要归因于 Ag 纳米粒子 (NPs) 表面等离子体共振 (SPR) 引起的可见光吸收和电子-空穴分离。自由基捕获实验表明,空穴 (h) 和超氧自由基 (O•) 是光催化 IC 染料降解的关键因素。