大气压力原子层沉积法提高聚二甲基硅氧烷的耐有机溶剂性能
Atmospheric pressure atomic layer deposition to increase organic solvent resistance of PDMS.
作者信息
Santoso Albert, Damen Afke, van Ommen J Ruud, van Steijn Volkert
机构信息
Department of Chemical Engineering, Delft University of Technology, Delft, The Netherlands.
出版信息
Chem Commun (Camb). 2022 Sep 27;58(77):10805-10808. doi: 10.1039/d2cc02402k.
Abstract
We explore three variants of atomic layer deposition (ALD) to deposit titanium oxide on the soft polymer polydimethylsiloxane (PDMS). We show that the organic solvent resistance of PDMS is increased by two orders of magnitude compared to uncoated PDMS for ALD performed at atmospheric pressure, which results in a unique surface-subsurface coating of PDMS.
摘要
我们探索了原子层沉积（ALD）的三种变体，以便在柔软的聚合物聚二甲基硅氧烷（PDMS）上沉积二氧化钛。我们表明，对于在大气压下进行的ALD，与未涂层的PDMS相比，PDMS的耐有机溶剂性提高了两个数量级，这导致了PDMS独特的表面-次表面涂层。
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