Zhang Binglei, Luo Yi, Liu Yang, Trukhin Valerii N, Mustafin Ilia A, Alekseev Prokhor A, Borodin Bogdan R, Eliseev Ilya A, Alkallas Fatemah H, Ben Gouider Trabelsi Amira, Kusmartseva Anna, Kusmartsev Fedor V
Microsystem and Terahertz Research Center, Chengdu 610200, China.
Ioffe Physical Technical Institute, Polytekhnicheskaya St., 26, St. Petersburg 194021, Russia.
Nanomaterials (Basel). 2022 Aug 23;12(17):2892. doi: 10.3390/nano12172892.
We have fabricated α-Sn/Ge quantum well heterostructures by sandwiching nano-films of α-Sn between Ge nanolayers. The samples were grown via e-beam deposition and characterized by Raman spectroscopy, atomic force microscopy, temperature dependence of electrical resistivity and THz time-resolved spectroscopy. We have established the presence of α-Sn phase in the polycrystalline layers together with a high electron mobility μ = 2500 ± 100 cm V s. Here, the temperature behavior of the resistivity in a magnetic field is distinct from the semiconducting films and three-dimensional Dirac semimetals, which is consistent with the presence of linear two-dimensional electronic dispersion arising from the mutually inverted band structure at the α-Sn/Ge interface. As a result, the α-Sn/Ge interfaces of the quantum wells have topologically non-trivial electronic states. From THz time-resolved spectroscopy, we have discovered unusual photocurrent and THz radiation generation. The mechanisms for this process are significantly different from ambipolar diffusion currents that are responsible for THz generation in semiconducting thin films, e.g., Ge. Moreover, the THz generation in α-Sn/Ge quantum wells is almost an order of magnitude greater than that found in Ge. The substantial strength of the THz radiation emission and its polarization dependence may be explained by the photon drag current. The large amplitude of this current is a clear signature of the formation of conducting channels with high electron mobility, which are topologically protected.
我们通过在锗纳米层之间夹入α - 锡纳米薄膜制备了α - 锡/锗量子阱异质结构。这些样品通过电子束沉积生长,并通过拉曼光谱、原子力显微镜、电阻率的温度依赖性和太赫兹时间分辨光谱进行表征。我们已经确定在多晶层中存在α - 锡相,同时具有高电子迁移率μ = 2500 ± 100 cm² V⁻¹ s⁻¹。在此,磁场中电阻率的温度行为与半导体薄膜和三维狄拉克半金属不同,这与α - 锡/锗界面处相互反转的能带结构产生的线性二维电子色散的存在相一致。结果,量子阱的α - 锡/锗界面具有拓扑非平凡的电子态。通过太赫兹时间分辨光谱,我们发现了异常的光电流和太赫兹辐射产生。这个过程的机制与负责半导体薄膜(如锗)中太赫兹产生的双极扩散电流有显著不同。此外,α - 锡/锗量子阱中的太赫兹产生几乎比锗中的大一个数量级。太赫兹辐射发射的高强度及其偏振依赖性可以用光子拖曳电流来解释。这种电流的大振幅是具有高电子迁移率的导电通道形成的明显标志,这些通道受到拓扑保护。