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单层石墨烯阵列辅助下硫化铜薄片的确定性合成

Deterministic synthesis of CuS flakes assisted by single-layer graphene arrays.

作者信息

Portone A, Bellucci L, Convertino D, Mezzadri F, Piccinini G, Giambra M A, Miseikis V, Rossi F, Coletti C, Fabbri F

机构信息

NEST, Istituto Nanoscienze - CNR, Scuola Normale Superiore Piazza San Silvestro 12 56127 Pisa Italy

CNI@NEST, Istituto Italiano di Tecnologia Piazza San Silvestro 12 56127 Pisa Italy.

出版信息

Nanoscale Adv. 2021 Feb 2;3(5):1352-1361. doi: 10.1039/d0na00997k. eCollection 2021 Mar 9.

Abstract

The employment of two-dimensional materials, as growth substrates or buffer layers, enables the epitaxial growth of layered materials with different crystalline symmetries with a preferential crystalline orientation and the synthesis of heterostructures with a large lattice constant mismatch. In this work, we employ single crystalline graphene to modify the sulfurization dynamics of copper foil for the deterministic synthesis of large-area CuS crystals. Molecular dynamics simulations using the Reax force-field are used to mimic the sulfurization process of a series of different atomistic systems specifically built to understand the role of graphene during the sulphur atom attack over the Cu(111) surface. CuS flakes show a flat morphology with an average lateral size of hundreds of micrometers. CuS presents a direct band-gap of 2.5 eV evaluated with light absorption and light emission spectroscopies. Electrical characterization shows that the CuS crystals present high p-type doping with a hole mobility of 2 cm V s.

摘要

使用二维材料作为生长衬底或缓冲层,能够实现具有不同晶体对称性的层状材料的外延生长,并具有优先的晶体取向,还能合成具有大晶格常数失配的异质结构。在这项工作中,我们使用单晶石墨烯来改变铜箔的硫化动力学,以确定性地合成大面积的硫化铜(CuS)晶体。使用Reax力场的分子动力学模拟用于模拟一系列不同原子系统的硫化过程,这些系统是专门构建的,以了解石墨烯在硫原子攻击铜(111)表面过程中的作用。硫化铜薄片呈现出扁平形态,平均横向尺寸为数百微米。通过光吸收和光发射光谱法评估,硫化铜具有2.5电子伏特的直接带隙。电学表征表明,硫化铜晶体呈现出高p型掺杂,空穴迁移率为2厘米²/(伏·秒)。

https://cdn.ncbi.nlm.nih.gov/pmc/blobs/7197/9419617/97efd3758c98/d0na00997k-f1.jpg

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