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用于紫外-可见光电探测的SiO/Si衬底上垂直取向的ReSSe纳米片形成的多孔阵列。

Vertically oriented ReSSe nanosheet-formed porous arrays on SiO/Si substrates for ultraviolet-visible photoelectric detection.

作者信息

He Zhiyong, Xiong Yuexu, Feng Wenlin

机构信息

School of Science, Chongqing University of Technology, Chongqing 400054, China.

School of Physics and Astronomy, China West Normal University, Nanchong 623300, China.

出版信息

Nanoscale. 2022 Oct 13;14(39):14585-14593. doi: 10.1039/d2nr03085c.

Abstract

Rhenium (Re)-based transition metal dichalcogenides (TMDs) have excellent in-plane anisotropic optical and electrical properties. However, their distorted octahedral (1T') structure and weak interlayer coupling easily lead to anisotropic and out-of-plane growth, which makes it particularly difficult to prepare large-area Re-based TMD continuous porous films on SiO/Si substrates. In this work, ReS films are synthesized on SiO/Si substrates by using tellurium (Te) powder-assisted chemical vapor deposition, and then the films are selenized to synthesize a series of continuous large-area ReSSe ( = 0, 0.34, 0.56, 0.84, and 0.91) nanosheet-formed porous films. Furthermore, prototype ReSSe photodetectors with different Se compositions are fabricated. The surface morphology, high quality crystallization and compositions are confirmed by various characterization techniques. The ReSSe photodetectors based on these films show excellent ultraviolet-visible (UV-vis) spectral responses and self-powered characteristics. The response time is faster, and the photocurrent increases with the Se composition. Due to the Schottky barrier generated by the Ag-ReSSe interface, the device without bias voltage has a superior responsivity (121.9 mA W), high detectivity (5.27 × 10 Jones), good on/off ratio (1.2 × 10) and fast response time (rising/decay times, 30/60 ms) under 365 nm light irradiation. This simple and controllable method opens up a new way to produce high-quality vertically oriented ReSSe porous arrays on SiO/Si substrates for next-generation application in UV-vis photodetectors.

摘要

基于铼(Re)的过渡金属二硫属化物(TMDs)具有优异的面内各向异性光学和电学性质。然而,它们扭曲的八面体(1T')结构和较弱的层间耦合容易导致各向异性和平面外生长,这使得在SiO/Si衬底上制备大面积的基于Re的TMD连续多孔膜尤为困难。在这项工作中,通过碲(Te)粉辅助化学气相沉积在SiO/Si衬底上合成了ReS膜,然后将这些膜进行硒化以合成一系列连续的大面积ReSSe( = 0、0.34、0.56、0.84和0.91)纳米片形成的多孔膜。此外,制备了具有不同硒成分的ReSSe光电探测器原型。通过各种表征技术确认了表面形貌、高质量结晶和成分。基于这些膜的ReSSe光电探测器表现出优异的紫外-可见(UV-vis)光谱响应和自供电特性。响应时间更快,光电流随硒成分增加。由于Ag-ReSSe界面产生的肖特基势垒,无偏压的器件在365 nm光照射下具有优异的响应度(121.9 mA W)、高探测率(5.27×10琼斯)、良好的开/关比(1.2×10)和快速响应时间(上升/衰减时间,30/60 ms)。这种简单且可控的方法为在SiO/Si衬底上制备高质量的垂直取向ReSSe多孔阵列开辟了一条新途径,可用于紫外-可见光电探测器的下一代应用。

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