Institute of Physics, University of Silesia, 75 Pulku Piechoty 1a, 41-500 Chorzow, Poland.
Silesian Center for Education and Interdisciplinary Research (SMCEBI), 75 Pulku Piechoty 1a, 41-500 Chorzow, Poland.
J Phys Chem B. 2022 Oct 13;126(40):8072-8079. doi: 10.1021/acs.jpcb.2c04541. Epub 2022 Sep 28.
The substrate roughness is a very important parameter that can influence the properties of supported thin films. In this work, we investigate the effect of surface roughness on the properties of a vapor-deposited glass (celecoxib, CXB) both in its bulk and in confined states. Using dielectric spectroscopy, we provide experimental evidence depicting a profound influence of surface roughness on the α-relaxation dynamics and the isothermal crystallization of this vapor-deposited glass. Besides, we have verified the influence of film confinement on varying values of surface roughnesses as well. At a fixed surface roughness value, the confinement could alter both the dynamics and crystallization of vapor-deposited CXB.
衬底粗糙度是一个非常重要的参数，它可以影响薄膜的性能。在这项工作中，我们研究了表面粗糙度对体相和受限状态下气相沉积玻璃（塞来昔布，CXB）性能的影响。我们使用介电谱，提供了实验证据，描绘了表面粗糙度对气相沉积玻璃的α弛豫动力学和等温结晶的深远影响。此外，我们还验证了薄膜受限对不同表面粗糙度值的影响。在固定的表面粗糙度值下，限制可以改变气相沉积 CXB 的动力学和结晶。
