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容错制造的宽带模式转换器及其工作原理。

Fabrication error tolerant broadband mode converters and their working principles.

作者信息

Masnad Md Mahadi, Zhang Guowu, Xu Dan-Xia, Grinberg Yuri, Liboiron-Ladouceur Odile

出版信息

Opt Express. 2022 Jul 4;30(14):25817-25829. doi: 10.1364/OE.461979.

Abstract

Computational inverse design techniques have shown potential to become reliable means for designing compact nanophotonic devices without compromising the performance. Much effort has been made to reduce the computation cost involved in the optimization process and obtain final designs that are robust to fabrication imperfections. In this work, we experimentally demonstrate TE0-TE1 and TE1-TE3 mode converters (MCs) on the silicon-on-insulator platform designed using the computationally efficient shape optimization method. These MCs have mode conversion efficiencies above 95%, and the insertion loss ranges from 0.3 dB to 1 dB over a wavelength span of 80 nm ranging from 1.5 µm to 1.58 µm. Maximum modal crosstalk found experimentally in the C-band is -19 dB. The conversion efficiency drops at most by 2.2% at 1.55 µm for 10 nm over/under etch, implying good robustness to dimensional variations. We present the mode conversion mechanism of these MCs by studying the simulated electromagnetic field patterns and validate with supportive data. We also demonstrate their performance in the time domain with a 28 Gbps OOK and a 20 GBaud PAM-4 payload transmissions, which supports their utility for high throughput data communications. The open eye diagrams exhibit Q-factors of 8 dB.

摘要

计算逆设计技术已显示出有潜力成为设计紧凑型纳米光子器件的可靠手段,同时又不影响其性能。人们已付出诸多努力来降低优化过程中的计算成本,并获得对制造缺陷具有鲁棒性的最终设计。在这项工作中,我们通过实验展示了在绝缘体上硅平台上使用计算效率高的形状优化方法设计的TE0 - TE1和TE1 - TE3模式转换器(MC)。这些MC的模式转换效率高于95%,在1.5 µm至1.58 µm的80 nm波长范围内,插入损耗在0.3 dB至1 dB之间。在C波段实验发现的最大模式串扰为 - 19 dB。对于10 nm过刻蚀/欠刻蚀,在1.55 µm处转换效率最多下降2.2%,这意味着对尺寸变化具有良好的鲁棒性。我们通过研究模拟电磁场模式来展示这些MC的模式转换机制,并用支持性数据进行验证。我们还通过28 Gbps开关键控(OOK)和20 GBaud脉冲幅度调制4(PAM - 4)有效载荷传输在时域中展示了它们的性能,这支持了它们在高吞吐量数据通信中的实用性。张开的眼图显示出8 dB的品质因数。

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