School of Electrical and Electronics Engineering, Chung-Ang University, Seoul06974, Korea.
Department of Electrical Engineering, Inha University, Incheon22212, Korea.
ACS Appl Mater Interfaces. 2022 Dec 21;14(50):56416-56426. doi: 10.1021/acsami.2c18865. Epub 2022 Dec 12.
Copper iodide (CuI) has emerged as a promising p-type semiconductor material owing to its excellent carrier mobility, high transparency, and solution processability. Although CuI has potential for numerous applications, including perovskite solar cells, photovoltaic devices, and thin-film transistors (TFTs), the close relationship between the anion vacancy generation and the charge transport mechanism in CuI-based devices is underexplored. In this study, we propose solution-processed p-type CuI TFTs which were subject to the thermal annealing process in air and vacuum atmospheres at temperatures of 100, 200, and 300 °C. The chemical states and surface morphologies of the CuI thin films were systematically investigated, revealing the generation of iodine vacancy states and the reduction of carrier concentration, as well as increased film density and grain size according to the annealing condition. Further, the effective role of the AlO passivation layer on the electrical characteristics of the solution-processed CuI TFTs is demonstrated for the first time, where the AlO precursor greatly enhanced the electrical performance of the CuI TFTs, exhibiting a field-effect mobility of 4.02 cm/V·s, a subthreshold swing of 0.61 V/decade, and an on/off current ratio of 1.12 × 10, which exceed the values of CuI TFTs reported so far. Based on the synergistic effects of the annealing process and the passivation layer that engineered the iodine vacancy state and morphology of CuI, the proposed CuI TFTs with the AlO passivation layer showed excellent reliability under 100 times repeated operation and long-term stability over 216 h, where the transfer curves slightly shifted in the positive direction of 1.36 and 1.88 V measured at a current level of 10 A for the reliability and stability tests, respectively. Thus, this work opens a new window for solution-processed p-type CuI TFTs with excellent stability for developing next-generation complementary logic circuits.
碘化亚铜 (CuI) 因其出色的载流子迁移率、高透明度和溶液加工性能而成为一种很有前途的 p 型半导体材料。尽管 CuI 具有在钙钛矿太阳能电池、光伏器件和薄膜晶体管 (TFT) 等多种应用中的潜力,但在基于 CuI 的器件中,阴离子空位产生与电荷输运机制之间的紧密关系尚未得到充分探索。在这项研究中,我们提出了通过溶液处理制备的 p 型 CuI TFT,这些器件经过在空气和真空环境中 100、200 和 300°C 的热退火处理。我们系统地研究了 CuI 薄膜的化学状态和表面形貌,结果表明,随着退火条件的变化,碘空位态的产生和载流子浓度的降低,以及薄膜密度和晶粒尺寸的增加。此外,我们首次证明了 AlO 钝化层对溶液处理的 CuI TFT 电性能的有效作用,其中 AlO 前体极大地提高了 CuI TFT 的电性能,表现出 4.02 cm/V·s 的场效应迁移率、0.61 V/decade 的亚阈值摆幅和 1.12×10 的导通/关断电流比,超过了迄今为止报道的 CuI TFT 的值。基于退火过程和钝化层协同作用对碘空位状态和 CuI 形貌的调控,具有 AlO 钝化层的 CuI TFT 在 100 次重复操作下表现出优异的可靠性,在 216 小时的长时间稳定性测试中,迁移曲线仅在正向方向上发生了微小的移动,正向移动的幅度分别为 1.36 和 1.88 V,这两个幅度是在可靠性和稳定性测试中分别在 10 A 的电流水平下测量得到的。因此,这项工作为开发具有优异稳定性的下一代互补逻辑电路的溶液处理 p 型 CuI TFT 开辟了新的窗口。