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黑磷电子学。

Black phosphorus electronics.

作者信息

Huang Hao, Jiang Bei, Zou Xuming, Zhao Xingzhong, Liao Lei

机构信息

School of Physics and Technology, Wuhan University, Wuhan 430072, China.

Key Laboratory for Micro/Nano-Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China.

出版信息

Sci Bull (Beijing). 2019 Aug 15;64(15):1067-1079. doi: 10.1016/j.scib.2019.02.015. Epub 2019 Feb 23.

Abstract

As the scaling of silicon-based field-effect transistors has approached its physical limits, the search for alternative channel materials for future logic devices has attracted much attention. The discovery of graphene has unveiled another material family with layered structures called two-dimensional (2D) materials. Black phosphorus (BP), the most stable allotrope of phosphorus, was introduced as a new type of 2D material in 2014. Thanks to its high mobility, in-plane anisotropy and direct band gap, BP is considered to be a promising candidate for next-generation electronic and optoelectronic devices. Numerous studies have demonstrated the beneficial effects of introducing BP for device architectures. Herein, we present a review outlining recent progress towards high performance BP-based transistors. This review starts with the fundamental properties of BP, including its crystal structure, bandgap, and direct current (DC) and radio-frequency (RF) characteristics, followed by a detailed description of the modulation and application of those properties, involving anisotropy, functionalization and superlattices. Furthermore, we also discuss device design for high-performance transistors, with particular emphasis on interface engineering and device stability. Finally, we offer our perspective on the future of BP electronics, aiming to benefit colleagues who are interested in this exciting research field.

摘要

随着硅基场效应晶体管的尺寸缩放已接近其物理极限,寻找未来逻辑器件的替代沟道材料已引起广泛关注。石墨烯的发现揭示了另一个具有层状结构的材料家族,即二维(2D)材料。黑磷(BP)作为磷最稳定的同素异形体,于2014年被引入作为一种新型二维材料。由于其高迁移率、面内各向异性和直接带隙,黑磷被认为是下一代电子和光电器件的有前途的候选材料。大量研究已经证明了在器件架构中引入黑磷的有益效果。在此,我们给出一篇综述,概述基于黑磷的高性能晶体管的最新进展。本综述首先介绍黑磷的基本性质,包括其晶体结构、带隙以及直流(DC)和射频(RF)特性,随后详细描述这些性质的调制和应用,涉及各向异性、功能化和超晶格。此外,我们还讨论了高性能晶体管的器件设计,特别强调界面工程和器件稳定性。最后,我们对黑磷电子学的未来给出展望,旨在使对这一令人兴奋的研究领域感兴趣的同行受益。

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