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通过 H 型异质双层 WS/MoS 的一步生长实现层内激子的负谷极化

Negative Valley Polarization of the Intralayer Exciton via One-Step Growth of H-Type Heterobilayer WS/MoS.

机构信息

Department of Physics and Energy Harvest-Storage Research Center, University of Ulsan, Ulsan44610, South Korea.

Department of Physics, Chung-Ang University, Seoul06794, South Korea.

出版信息

ACS Nano. 2023 Feb 14;17(3):2629-2638. doi: 10.1021/acsnano.2c10581. Epub 2023 Jan 23.

Abstract

Vertical type II van der Waals heterobilayers of transition metal dichalcogenides (TMDs) have attracted wide attention due to their distinctive features mostly arising from the emergence of intriguing electronic structures that include moiré-related phenomena. Owing to strong spin-orbit coupling under a noncentrosymmetric environment, TMD heterobilayers host nonequivalent + and - valleys of contrasting Berry curvatures, which can be optically controlled by the helicity of optical excitation. The corresponding valley selection rules are well established by not only intralayer excitons but also interlayer excitons. Quite intriguingly, here, we experimentally demonstrate that unusual valley switching can be achieved using the lowest-lying intralayer excitons in H-type heterobilayer WS/MoS prepared by one-step growth. This TMD combination provides an ideal case for interlayer coupling with an almost perfect lattice match, thereby also in the momentum space between + and - valleys in the H-type heterostructure. The underlying valley-switching mechanism can be understood by bright-to-dark conversion of initially created electrons in the valley of WS, followed by interlayer charge transfer to the opposite valley in MoS. Our suggested model is also confirmed by the absence of valley switching when the lowest-lying excitons in MoS are directly generated in the heterobilayer. In contrast to the H-type case, we show that no valley switching is observed from R-type heterobilayers prepared by the same method, where interlayer charge transfer does not occur between the opposite valleys. We compare the case with the series of valley polarization data from other heterobilayer combinations obtained under different excitation energies and temperatures. Our valley switching mechanism can be utilized for valley manipulation by controlling the excitation photon energy together with the photon helicity in valleytronic devices derived from H-type TMD heterobilayers.

摘要

过渡金属二硫属化物 (TMD) 的垂直型 II 型范德华异质结由于其独特的特性而受到广泛关注,这些特性主要源于出现了有趣的电子结构,包括莫尔相关现象。由于在非中心对称环境下存在强自旋轨道耦合,TMD 异质结中存在具有不同 Berry 曲率的等价 + 和 - 谷,这些谷可以通过光激发的螺旋度来光学控制。相应的谷选择规则不仅由层内激子确定,也由层间激子确定。非常有趣的是,在这里,我们通过一步生长制备的 H 型异质结 WS/MoS 中的最低层内激子实验证明了可以实现异常谷切换。这种 TMD 组合提供了具有几乎完美晶格匹配的层间耦合的理想情况,从而在 H 型异质结构中的 + 和 - 谷之间的动量空间中也是如此。通过在 WS 谷中最初产生的电子的亮暗转换,以及随后向 MoS 相反谷的层间电荷转移,可以理解底层谷切换机制。当 MoS 中的最低层激子直接在异质层中产生时,我们的建议模型也得到了证实,此时没有谷切换。与 H 型情况相反,我们表明,当使用相同方法制备的 R 型异质层中不会发生谷切换,因为相反谷之间不会发生层间电荷转移。我们将这种情况与在不同激发能量和温度下从其他异质层组合获得的一系列谷极化数据进行了比较。我们的谷切换机制可以通过控制激发光子能量以及来自 H 型 TMD 异质层的谷电子器件中的光子螺旋度来用于谷操纵。

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