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垂直异质双层中的独特谷极化:边缘成核与中心成核的WS/MoS之间的差异

Distinct Valley Polarization in Vertical Heterobilayers: Difference between Edge- and Center-Nucleated WS/MoS.

作者信息

Le Chinh Tam, Lee Je-Ho, Hoang Nguyen The, Dang Dinh Khoi, Kim Jungcheol, Jang Joon I, Seong Maeng-Je, Kim Yong Soo

机构信息

Department of Semiconductor Physics & Engineering and Energy Harvest-Storage Research Center, University of Ulsan, Ulsan 44610, South Korea.

Department of Physics and Center for Berry Curvature-Based New Phenomena, Chung-Ang University, Seoul 06974, South Korea.

出版信息

ACS Appl Mater Interfaces. 2024 Jul 31;16(30):39528-39538. doi: 10.1021/acsami.4c03379. Epub 2024 Jul 17.

Abstract

Structural imperfections can cause both beneficial and detrimental consequences on the excitonic characteristics of transition metal dichalcogenides (TMDs). Regarding valley selection, structural defects typically promote valley depolarization in monolayer TMDs, but defect healing via an additional growth process can restore valley polarization in vertical heterobilayers (VHs). In this study, we analyzed the valley polarization of center-nucleated and edge-nucleated VHs (WS/MoS) grown using a controlled growth process and discovered that defect-related photoluminescence (PL) is strongly suppressed in the center-nucleated VHs due to defect healing. Additionally, we demonstrated that the valley polarization of lower-lying intralayer excitons is more sensitive to the defect density of the sample than to higher-lying intralayer excitons. Despite defect healing in the center-nucleated VHs, the temperature-dependent PL study indicated that valley depolarization of the lower-lying intralayer excitons becomes significant below 100 K because of stronger hybridization of defect states. Also, we conducted a comprehensive study on the excitation intensity dependence to investigate the electron-doping-induced Auger recombination mechanism, which also contributes to valley depolarization of intralayer excitons via regeneration of intervalley trions. Our findings provide valuable insight into the development of VH-based valleytronic devices.

摘要

结构缺陷会对过渡金属二硫属化物(TMDs)的激子特性产生有益和有害的影响。关于谷值选择,结构缺陷通常会促进单层TMDs中的谷值去极化,但通过额外生长过程进行的缺陷修复可以恢复垂直异质双层(VHs)中的谷值极化。在本研究中,我们分析了使用可控生长过程生长的中心成核和边缘成核VHs(WS/MoS)的谷值极化,发现由于缺陷修复,中心成核VHs中与缺陷相关的光致发光(PL)被强烈抑制。此外,我们证明,较低层内激子的谷值极化对样品的缺陷密度比对较高层内激子更敏感。尽管中心成核VHs中存在缺陷修复,但温度依赖的PL研究表明,由于缺陷态的更强杂化,较低层内激子的谷值去极化在100 K以下变得显著。此外,我们对激发强度依赖性进行了全面研究,以研究电子掺杂诱导的俄歇复合机制,该机制也通过层间三重态的再生导致层内激子的谷值去极化。我们的研究结果为基于VH的谷电子学器件的发展提供了有价值的见解。

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